Assignee
PETER WOLTERS CMP SYSTEME GMBH
DE·4 granted patents·30 citations·filing 2001–2002
Top patents by PatentIndex Score
4 records- 0164US6780083B2Apparatus and method for the chemical mechanical polishing of the surface of circular flat workpieces, in particular semi-conductor wafersPETER WOLTERS CMP SYSTEME GMBH·Filed 2002·Granted Aug 24, 2004·13 cites·26 claims
- 0261US6866468B2Loading and unloading station for a device for the processing of circular flat work-pieces, especially semiconductor wafersPETER WOLTERS CMP SYSTEME GMBH·Filed 2002·Granted Mar 15, 2005·11 cites·15 claims
- 0352US6767276B2Holder for flat workpieces, particularly semiconductor wafersPETER WOLTERS CMP SYSTEME GMBH·Filed 2001·Granted Jul 27, 2004·6 cites·6 claims
- 0433US6709323B2Holder for flat workpieces, particularly semiconductor wafersPETER WOLTERS CMP SYSTEME GMBH·Filed 2001·Granted Mar 23, 2004·0 cites·6 claims
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