Assignee

ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC

US·128 granted patents·39 pending applications·172 citations·filing 2013–2024

Technology mixB24B144 H10P118 H01L85 C09G70 B24D62 C09K55

Top patents by PatentIndex Score

167 records

0196US10119048B1Low-abrasive CMP slurry compositions with tunable selectivityROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Nov 6, 2018·24 cites·11 claims
0295US10391606B2Chemical mechanical polishing pads for improved removal rate and planarizationROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Aug 27, 2019·10 cites·10 claims
0394US11548114B1Compressible non-reticulated polyurea polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2021·Granted Jan 10, 2023·3 cites·10 claims
0494US9783702B1Aqueous compositions of low abrasive silica particlesROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 10, 2017·16 cites·11 claims
0594US9484212B1Chemical mechanical polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Nov 1, 2016·12 cites·10 claims
0693US11679531B2Chemical mechanical polishing pad and preparation thereofROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2021·Granted Jun 20, 2023·2 cites·9 claims
0793US11472984B1Method of enhancing the removal rate of polysiliconROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2021·Granted Oct 18, 2022·2 cites·8 claims
0892US10604678B1Chemical mechanical polishing of tungsten using a method and composition containing quaternary phosphonium compoundsROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Granted Mar 31, 2020·4 cites·6 claims
0992US9475168B2Polishing pad windowROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Oct 25, 2016·5 cites·10 claims
1092US9457449B1Chemical mechanical polishing pad with composite polishing layerROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Oct 4, 2016·9 cites·10 claims
1191US10569384B1Chemical mechanical polishing pad and polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2018·Granted Feb 25, 2020·3 cites·10 claims
1291US9925637B2Tapered poromeric polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Mar 27, 2018·6 cites·10 claims
1390US10626298B1Chemical mechanical polishing compositions and methods for suppressing the removal rate of amorphous siliconROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Granted Apr 21, 2020·5 cites·10 claims
1490US9539694B1Composite polishing layer chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Jan 10, 2017·8 cites·8 claims
1588US11633830B2CMP polishing pad with uniform windowROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2020·Granted Apr 25, 2023·2 cites·9 claims
1688US10464188B1Chemical mechanical polishing pad and polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2018·Granted Nov 5, 2019·2 cites·10 claims
1788US10259099B2Tapering method for poromeric polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Apr 16, 2019·4 cites·10 claims
1888US10106662B2Thermoplastic poromeric polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 23, 2018·3 cites·10 claims
1988US9803108B1Aqueous compositions of stabilized aminosilane group containing silica particlesROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 31, 2017·6 cites·11 claims
2086US10037889B1Cationic particle containing slurries and methods of using them for CMP of spin-on carbon filmsROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Jul 31, 2018·4 cites·10 claims
2186US9586304B2Controlled-expansion CMP PAD casting methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2014·Granted Mar 7, 2017·7 cites·10 claims
2284US9737971B2Chemical mechanical polishing pad, polishing layer analyzer and methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Aug 22, 2017·4 cites·9 claims
2382US10086543B2Auto catch apparatus and method of use in making chemical mechanical polishing padsROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 2, 2018·3 cites·8 claims
2482US9802293B1Method to shape the surface of chemical mechanical polishing padsROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 31, 2017·2 cites·13 claims
2582US2024091901A1Cmp polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2023·Application pending·0 cites
2681US10293456B2Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing themROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2018·Granted May 21, 2019·3 cites·10 claims
2781US10170335B1Chemical mechanical polishing method for cobaltROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Jan 1, 2019·3 cites·8 claims
2881US9984895B1Chemical mechanical polishing method for tungstenROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted May 29, 2018·3 cites·8 claims
2980US10464187B2High removal rate chemical mechanical polishing pads from amine initiated polyol containing curativesROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Nov 5, 2019·1 cites·10 claims
3078US10787592B1Chemical mechanical polishing compositions and methods having enhanced defect inhibition and selectively polishing silicon nitride over silicon dioxide in an acid environmentROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Granted Sep 29, 2020·2 cites·8 claims
3177US2025058426A1Leveraged poromeric polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2024·Application pending·0 cites
3276US10600655B2Chemical mechanical polishing method for tungstenROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2018·Granted Mar 24, 2020·2 cites·10 claims
3376US2023347470A1Pad for chemical mechanical polishingROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2022·Application pending·0 cites
3475US12491604B2Chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2022·Granted Dec 9, 2025·0 cites·5 claims
3575US12447582B2Chemical mechanical polishing pad with fluorinated polymer and multimodal groove patternROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2023·Granted Oct 21, 2025·0 cites·7 claims
3675US2023166381A1Cmp polishing pad with polishing elements on supportsROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2023·Application pending·0 cites
3774US12384002B2Composite pad for chemical mechanical polishingROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2022·Granted Aug 12, 2025·0 cites·10 claims
3873US2025303517A1Polishing pad with endpoint detection windowROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2024·Application pending·0 cites
3973US2025303516A1Multifunctional endpoint detection windowROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2024·Application pending·0 cites
4073US2025303515A1Multifunctional endpoint detection windowROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2024·Application pending·0 cites
4172US12138737B2CMP polishing pad with enhanced rateROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2021·Granted Nov 12, 2024·0 cites·8 claims
4272US9630293B2Chemical mechanical polishing pad composite polishing layer formulationROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Apr 25, 2017·2 cites·11 claims
4372US9452507B2Controlled-viscosity CMP casting methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2014·Granted Sep 27, 2016·1 cites·8 claims
4471US2023015668A1Cmp polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2021·Application pending·0 cites
4570US10086494B2High planarization efficiency chemical mechanical polishing pads and methods of makingROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 2, 2018·1 cites·10 claims
4670US2024253176A1Polishing pad with endpoint windowROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2024·Application pending·0 cites
4770US2024253177A1Polishing pad with endpoint detection windowROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2024·Application pending·0 cites
4869US11285577B2Thin film fluoropolymer composite CMP polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Granted Mar 29, 2022·1 cites·10 claims
4969US2023294240A1Chemical mechanical polishing pads for improved removal rate and planarizationROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2023·Application pending·0 cites
5068US12528152B2CMP pad having ultra expanded polymer microspheresROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2022·Granted Jan 20, 2026·0 cites·8 claims

Showing the top 50 of 167 patent records by PatentIndex Score.

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