Assignee
SAWADA TOSHIYUKI
JP·9 granted patents·5 citations·filing 2007–2012
Top patents by PatentIndex Score
9 records- 0177US9208812B2Soft magnetic alloy for magnetic recording medium, sputtering target material, and magnetic recording mediumSAWADA TOSHIYUKI·Filed 2011·Granted Dec 8, 2015·2 cites·6 claims
- 0269US8080201B2Method for producing sputtering target material for Ni-W based interlayerSAWADA TOSHIYUKI·Filed 2008·Granted Dec 20, 2011·1 cites·2 claims
- 0368US8066825B2(CoFe)Zr/Nb/Ta/Hf based target materialSAWADA TOSHIYUKI·Filed 2007·Granted Nov 29, 2011·1 cites·2 claims
- 0466US9114485B2Ti-based brazing filler metal and method for producing the sameSAWADA TOSHIYUKI·Filed 2010·Granted Aug 25, 2015·1 cites·11 claims
- 0558US9293166B2Sputtering target material for producing intermediate layer film of perpendicular magnetic recording medium and thin film produced by using the sameSAWADA TOSHIYUKI·Filed 2009·Granted Mar 22, 2016·0 cites·2 claims
- 0657US9397334B2Si alloy powder for negative electrode of lithium-ion secondary cell, and method for manufacturing sameSAWADA TOSHIYUKI·Filed 2012·Granted Jul 19, 2016·0 cites·12 claims
- 0755US9458529B2High-hardness shot material for shot peening and shot peening methodSAWADA TOSHIYUKI·Filed 2011·Granted Oct 4, 2016·0 cites·6 claims
- 0853US9656371B2High-hardness atomized powder, powder for projecting material for shot peening, and shot peening method using sameSAWADA TOSHIYUKI·Filed 2012·Granted May 23, 2017·0 cites·8 claims
- 0950US8978959B2Ni—Fe-based alloy brazing filler materialSAWADA TOSHIYUKI·Filed 2010·Granted Mar 17, 2015·0 cites·10 claims
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