Assignee
SEMITOOL INC
US·384 granted patents·62 pending applications·16,698 citations·filing 1987–2007
Top patents by PatentIndex Score
446 records- 0199US6976822B2End-effectors and transfer devices for handling microelectronic workpiecesSEMITOOL INC·Filed 2003·Granted Dec 20, 2005·526 cites·44 claims
- 0299US6565729B2Method for electrochemically depositing metal on a semiconductor workpieceSEMITOOL INC·Filed 2000·Granted May 20, 2003·435 cites·59 claims
- 0399US6447232B1Semiconductor wafer processing apparatus having improved wafer input/output handling systemSEMITOOL INC·Filed 1997·Granted Sep 10, 2002·499 cites·30 claims
- 0499US6080291AApparatus for electrochemically processing a workpiece including an electrical contact assembly having a seal memberSEMITOOL INC·Filed 1998·Granted Jun 27, 2000·388 cites·8 claims
- 0598US6932892B2Apparatus and method for electrolytically depositing copper on a semiconductor workpieceSEMITOOL INC·Filed 2003·Granted Aug 23, 2005·226 cites·5 claims
- 0698US6428673B1Apparatus and method for electrochemical processing of a microelectronic workpiece, capable of modifying processing based on metrologySEMITOOL INC·Filed 2000·Granted Aug 6, 2002·102 cites·17 claims
- 0798US6197181B1Apparatus and method for electrolytically depositing a metal on a microelectronic workpieceSEMITOOL INC·Filed 1998·Granted Mar 6, 2001·649 cites·64 claims
- 0898US5947718ASemiconductor processing furnaceSEMITOOL INC·Filed 1997·Granted Sep 7, 1999·502 cites·25 claims
- 0997US6638410B2Apparatus and method for electrolytically depositing copper on a semiconductor workpieceSEMITOOL INC·Filed 2002·Granted Oct 28, 2003·110 cites·24 claims
- 1097US6627051B2Cathode current control system for a wafer electroplating apparatusSEMITOOL INC·Filed 2001·Granted Sep 30, 2003·57 cites·7 claims
- 1197US6497801B1Electroplating apparatus with segmented anode arraySEMITOOL INC·Filed 1998·Granted Dec 24, 2002·120 cites·14 claims
- 1297US6319387B1Copper alloy electroplating bath for microelectronic applicationsSEMITOOL INC·Filed 1999·Granted Nov 20, 2001·300 cites·12 claims
- 1397US6228232B1Reactor vessel having improved cup anode and conductor assemblySEMITOOL INC·Filed 1998·Granted May 8, 2001·110 cites·22 claims
- 1496US6569297B2Workpiece processor having processing chamber with improved processing fluid flowSEMITOOL INC·Filed 2001·Granted May 27, 2003·39 cites·52 claims
- 1596US6286231B1Method and apparatus for high-pressure wafer processing and dryingSEMITOOL INC·Filed 2000·Granted Sep 11, 2001·178 cites·56 claims
- 1696US6277263B1Apparatus and method for electrolytically depositing copper on a semiconductor workpieceSEMITOOL INC·Filed 1999·Granted Aug 21, 2001·151 cites·30 claims
- 1796US6273108B1Apparatus and method for processing the surface of a workpiece with ozoneSEMITOOL INC·Filed 2000·Granted Aug 14, 2001·93 cites·21 claims
- 1896US6267125B1Apparatus and method for processing the surface of a workpiece with ozoneSEMITOOL INC·Filed 2000·Granted Jul 31, 2001·104 cites·25 claims
- 1996US5377708AMulti-station semiconductor processor with volatilizationSEMITOOL INC·Filed 1993·Granted Jan 3, 1995·247 cites·83 claims
- 2096US5222310ASingle wafer processor with a frameSEMITOOL INC·Filed 1991·Granted Jun 29, 1993·219 cites·14 claims
- 2195US7931786B2Apparatus and method for agitating liquids in wet chemical processing of microfeature workpiecesSEMITOOL INC·Filed 2006·Granted Apr 26, 2011·18 cites·25 claims
- 2295US6497768B2Process for treating a workpiece with hydrofluoric acid and ozoneSEMITOOL INC·Filed 2001·Granted Dec 24, 2002·53 cites·28 claims
- 2395US6440178B2Modular semiconductor workpiece processing toolSEMITOOL INC·Filed 2001·Granted Aug 27, 2002·82 cites·12 claims
- 2495US6290833B1Method for electrolytically depositing copper on a semiconductor workpieceSEMITOOL INC·Filed 1999·Granted Sep 18, 2001·121 cites·27 claims
- 2595US6254742B1Diffuser with spiral opening pattern for an electroplating reactor vesselSEMITOOL INC·Filed 1999·Granted Jul 3, 2001·130 cites·19 claims
- 2695US6203582B1Modular semiconductor workpiece processing toolSEMITOOL INC·Filed 1996·Granted Mar 20, 2001·154 cites·14 claims
- 2795US5471872AAcoustic liquid level measuring apparatusSEMITOOL INC·Filed 1994·Granted Dec 5, 1995·98 cites·25 claims
- 2894US7332066B2Apparatus and method for electrochemically depositing metal on a semiconductor workpieceSEMITOOL INC·Filed 2005·Granted Feb 19, 2008·19 cites·38 claims
- 2994US6547937B1Microelectronic workpiece processing tool including a processing reactor having a paddle assembly for agitation of a processing fluid proximate to the workpieceSEMITOOL INC·Filed 2000·Granted Apr 15, 2003·61 cites·34 claims
- 3094US6342137B1Lift and rotate assembly for use in a workpiece processing station and a method of attaching the sameSEMITOOL INC·Filed 2000·Granted Jan 29, 2002·66 cites·9 claims
- 3194US6318951B1Robots for microelectronic workpiece handlingSEMITOOL INC·Filed 1999·Granted Nov 20, 2001·180 cites·21 claims
- 3294US6309520B1Methods and apparatus for processing the surface of a microelectronic workpieceSEMITOOL INC·Filed 1999·Granted Oct 30, 2001·92 cites·61 claims
- 3394US6240933B1Methods for cleaning semiconductor surfacesSEMITOOL INC·Filed 1997·Granted Jun 5, 2001·118 cites·85 claims
- 3494US6004440ACathode current control system for a wafer electroplating apparatusSEMITOOL INC·Filed 1997·Granted Dec 21, 1999·117 cites·25 claims
- 3594US5985126ASemiconductor plating system workpiece support having workpiece engaging electrodes with distal contact part and dielectric coverSEMITOOL INC·Filed 1997·Granted Nov 16, 1999·121 cites·28 claims
- 3694US5235995ASemiconductor processor apparatus with dynamic wafer vapor treatment and particulate volatilizationSEMITOOL INC·Filed 1991·Granted Aug 17, 1993·168 cites·30 claims
- 3793US7842173B2Apparatus and methods for electrochemical processing of microfeature wafersSEMITOOL INC·Filed 2007·Granted Nov 30, 2010·9 cites·24 claims
- 3893US6660137B2System for electrochemically processing a workpieceSEMITOOL INC·Filed 2001·Granted Dec 9, 2003·78 cites·18 claims
- 3993US6632292B1Selective treatment of microelectronic workpiece surfacesSEMITOOL INC·Filed 2000·Granted Oct 14, 2003·62 cites·24 claims
- 4093US6632345B1Apparatus and method for electrolytically depositing a metal on a workpieceSEMITOOL INC·Filed 2000·Granted Oct 14, 2003·47 cites·12 claims
- 4193US6471913B1Method and apparatus for processing a microelectronic workpiece including an apparatus and method for executing a processing step at an elevated temperatureSEMITOOL INC·Filed 2000·Granted Oct 29, 2002·66 cites·22 claims
- 4293US6350319B1Micro-environment reactor for processing a workpieceSEMITOOL INC·Filed 1998·Granted Feb 26, 2002·88 cites·33 claims
- 4393US6334937B1Apparatus for high deposition rate solder electroplating on a microelectronic workpieceSEMITOOL INC·Filed 1999·Granted Jan 1, 2002·104 cites·18 claims
- 4493US6309524B1Methods and apparatus for processing the surface of a microelectronic workpieceSEMITOOL INC·Filed 1999·Granted Oct 30, 2001·107 cites·39 claims
- 4593US6091498ASemiconductor processing apparatus having lift and tilt mechanismSEMITOOL INC·Filed 1997·Granted Jul 18, 2000·115 cites·12 claims
- 4693US5224504ASingle wafer processorSEMITOOL INC·Filed 1992·Granted Jul 6, 1993·200 cites·5 claims
- 4792US7857958B2Method and apparatus for controlling vessel characteristics, including shape and thieving current for processing microfeature workpiecesSEMITOOL INC·Filed 2007·Granted Dec 28, 2010·17 cites·23 claims
- 4892US7371998B2Thermal wafer processorSEMITOOL INC·Filed 2006·Granted May 13, 2008·20 cites·19 claims
- 4992US6869487B1Process and apparatus for treating a workpiece such as a semiconductor waferSEMITOOL INC·Filed 2000·Granted Mar 22, 2005·53 cites·25 claims
- 5092US6672820B1Semiconductor processing apparatus having linear conveyer systemSEMITOOL INC·Filed 1997·Granted Jan 6, 2004·145 cites·13 claims
Showing the top 50 of 446 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when SEMITOOL INC files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →