Assignee
SEMITOOL INC
US·384 granted patents·62 pending applications·16,698 citations·filing 1987–2007
Top patents by PatentIndex Score
446 records- 0199US6976822B2End-effectors and transfer devices for handling microelectronic workpiecesSEMITOOL INC·Filed 2003·Granted Dec 20, 2005·526 cites·44 claims
- 0299US6565729B2Method for electrochemically depositing metal on a semiconductor workpieceSEMITOOL INC·Filed 2000·Granted May 20, 2003·435 cites·59 claims
- 0399US6447232B1Semiconductor wafer processing apparatus having improved wafer input/output handling systemSEMITOOL INC·Filed 1997·Granted Sep 10, 2002·499 cites·30 claims
- 0499US6080291AApparatus for electrochemically processing a workpiece including an electrical contact assembly having a seal memberSEMITOOL INC·Filed 1998·Granted Jun 27, 2000·388 cites·8 claims
- 0598US6932892B2Apparatus and method for electrolytically depositing copper on a semiconductor workpieceSEMITOOL INC·Filed 2003·Granted Aug 23, 2005·226 cites·5 claims
- 0698US6428673B1Apparatus and method for electrochemical processing of a microelectronic workpiece, capable of modifying processing based on metrologySEMITOOL INC·Filed 2000·Granted Aug 6, 2002·102 cites·17 claims
- 0798US6197181B1Apparatus and method for electrolytically depositing a metal on a microelectronic workpieceSEMITOOL INC·Filed 1998·Granted Mar 6, 2001·649 cites·64 claims
- 0898US5947718ASemiconductor processing furnaceSEMITOOL INC·Filed 1997·Granted Sep 7, 1999·502 cites·25 claims
- 0997US6638410B2Apparatus and method for electrolytically depositing copper on a semiconductor workpieceSEMITOOL INC·Filed 2002·Granted Oct 28, 2003·110 cites·24 claims
- 1097US6627051B2Cathode current control system for a wafer electroplating apparatusSEMITOOL INC·Filed 2001·Granted Sep 30, 2003·57 cites·7 claims
- 1197US6497801B1Electroplating apparatus with segmented anode arraySEMITOOL INC·Filed 1998·Granted Dec 24, 2002·120 cites·14 claims
- 1297US6319387B1Copper alloy electroplating bath for microelectronic applicationsSEMITOOL INC·Filed 1999·Granted Nov 20, 2001·300 cites·12 claims
- 1397US6228232B1Reactor vessel having improved cup anode and conductor assemblySEMITOOL INC·Filed 1998·Granted May 8, 2001·110 cites·22 claims
- 1496US6569297B2Workpiece processor having processing chamber with improved processing fluid flowSEMITOOL INC·Filed 2001·Granted May 27, 2003·39 cites·52 claims
- 1596US6286231B1Method and apparatus for high-pressure wafer processing and dryingSEMITOOL INC·Filed 2000·Granted Sep 11, 2001·178 cites·56 claims
- 1696US6277263B1Apparatus and method for electrolytically depositing copper on a semiconductor workpieceSEMITOOL INC·Filed 1999·Granted Aug 21, 2001·151 cites·30 claims
- 1796US6273108B1Apparatus and method for processing the surface of a workpiece with ozoneSEMITOOL INC·Filed 2000·Granted Aug 14, 2001·93 cites·21 claims
- 1896US6267125B1Apparatus and method for processing the surface of a workpiece with ozoneSEMITOOL INC·Filed 2000·Granted Jul 31, 2001·104 cites·25 claims
- 1996US5377708AMulti-station semiconductor processor with volatilizationSEMITOOL INC·Filed 1993·Granted Jan 3, 1995·247 cites·83 claims
- 2096US5222310ASingle wafer processor with a frameSEMITOOL INC·Filed 1991·Granted Jun 29, 1993·219 cites·14 claims
- 2195US7931786B2Apparatus and method for agitating liquids in wet chemical processing of microfeature workpiecesSEMITOOL INC·Filed 2006·Granted Apr 26, 2011·18 cites·25 claims
- 2295US6497768B2Process for treating a workpiece with hydrofluoric acid and ozoneSEMITOOL INC·Filed 2001·Granted Dec 24, 2002·53 cites·28 claims
- 2395US6440178B2Modular semiconductor workpiece processing toolSEMITOOL INC·Filed 2001·Granted Aug 27, 2002·82 cites·12 claims
- 2495US6290833B1Method for electrolytically depositing copper on a semiconductor workpieceSEMITOOL INC·Filed 1999·Granted Sep 18, 2001·121 cites·27 claims
- 2595US6254742B1Diffuser with spiral opening pattern for an electroplating reactor vesselSEMITOOL INC·Filed 1999·Granted Jul 3, 2001·130 cites·19 claims
- 2695US6203582B1Modular semiconductor workpiece processing toolSEMITOOL INC·Filed 1996·Granted Mar 20, 2001·154 cites·14 claims
- 2795US5471872AAcoustic liquid level measuring apparatusSEMITOOL INC·Filed 1994·Granted Dec 5, 1995·98 cites·25 claims
- 2894US7332066B2Apparatus and method for electrochemically depositing metal on a semiconductor workpieceSEMITOOL INC·Filed 2005·Granted Feb 19, 2008·19 cites·38 claims
- 2994US6547937B1Microelectronic workpiece processing tool including a processing reactor having a paddle assembly for agitation of a processing fluid proximate to the workpieceSEMITOOL INC·Filed 2000·Granted Apr 15, 2003·61 cites·34 claims
- 3094US6342137B1Lift and rotate assembly for use in a workpiece processing station and a method of attaching the sameSEMITOOL INC·Filed 2000·Granted Jan 29, 2002·66 cites·9 claims
- 3194US6318951B1Robots for microelectronic workpiece handlingSEMITOOL INC·Filed 1999·Granted Nov 20, 2001·180 cites·21 claims
- 3294US6309520B1Methods and apparatus for processing the surface of a microelectronic workpieceSEMITOOL INC·Filed 1999·Granted Oct 30, 2001·92 cites·61 claims
- 3394US6240933B1Methods for cleaning semiconductor surfacesSEMITOOL INC·Filed 1997·Granted Jun 5, 2001·118 cites·85 claims
- 3494US6004440ACathode current control system for a wafer electroplating apparatusSEMITOOL INC·Filed 1997·Granted Dec 21, 1999·117 cites·25 claims
- 3594US5985126ASemiconductor plating system workpiece support having workpiece engaging electrodes with distal contact part and dielectric coverSEMITOOL INC·Filed 1997·Granted Nov 16, 1999·121 cites·28 claims
- 3694US5235995ASemiconductor processor apparatus with dynamic wafer vapor treatment and particulate volatilizationSEMITOOL INC·Filed 1991·Granted Aug 17, 1993·168 cites·30 claims
- 3793US7842173B2Apparatus and methods for electrochemical processing of microfeature wafersSEMITOOL INC·Filed 2007·Granted Nov 30, 2010·9 cites·24 claims
- 3893US6660137B2System for electrochemically processing a workpieceSEMITOOL INC·Filed 2001·Granted Dec 9, 2003·78 cites·18 claims
- 3993US6632292B1Selective treatment of microelectronic workpiece surfacesSEMITOOL INC·Filed 2000·Granted Oct 14, 2003·62 cites·24 claims
- 4093US6632345B1Apparatus and method for electrolytically depositing a metal on a workpieceSEMITOOL INC·Filed 2000·Granted Oct 14, 2003·47 cites·12 claims
- 4193US6471913B1Method and apparatus for processing a microelectronic workpiece including an apparatus and method for executing a processing step at an elevated temperatureSEMITOOL INC·Filed 2000·Granted Oct 29, 2002·66 cites·22 claims
- 4293US6350319B1Micro-environment reactor for processing a workpieceSEMITOOL INC·Filed 1998·Granted Feb 26, 2002·88 cites·33 claims
- 4393US6334937B1Apparatus for high deposition rate solder electroplating on a microelectronic workpieceSEMITOOL INC·Filed 1999·Granted Jan 1, 2002·104 cites·18 claims
- 4493US6309524B1Methods and apparatus for processing the surface of a microelectronic workpieceSEMITOOL INC·Filed 1999·Granted Oct 30, 2001·107 cites·39 claims
- 4593US6091498ASemiconductor processing apparatus having lift and tilt mechanismSEMITOOL INC·Filed 1997·Granted Jul 18, 2000·115 cites·12 claims
- 4693US5224504ASingle wafer processorSEMITOOL INC·Filed 1992·Granted Jul 6, 1993·200 cites·5 claims
- 4792US7857958B2Method and apparatus for controlling vessel characteristics, including shape and thieving current for processing microfeature workpiecesSEMITOOL INC·Filed 2007·Granted Dec 28, 2010·17 cites·23 claims
- 4892US7371998B2Thermal wafer processorSEMITOOL INC·Filed 2006·Granted May 13, 2008·20 cites·19 claims
- 4992US6869487B1Process and apparatus for treating a workpiece such as a semiconductor waferSEMITOOL INC·Filed 2000·Granted Mar 22, 2005·53 cites·25 claims
- 5092US6672820B1Semiconductor processing apparatus having linear conveyer systemSEMITOOL INC·Filed 1997·Granted Jan 6, 2004·145 cites·13 claims
Showing the top 50 of 446 patent records by PatentIndex Score.
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →