Assignee
SETEK M KK
JP·3 granted patents·72 citations·filing 1991–1996
Top patents by PatentIndex Score
3 records- 0165US5270250AMethod of fabricating semiconductor substrate having very shallow impurity diffusion layerSETEK M KK·Filed 1991·Granted Dec 14, 1993·44 cites·1 claims
- 0253US5795401AMethod for scrubbing substrateSETEK M KK·Filed 1996·Granted Aug 18, 1998·19 cites·4 claims
- 0336US5465447AApparatus for scrubbing substrateSETEK M KK·Filed 1994·Granted Nov 14, 1995·9 cites·8 claims
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