Assignee
SEWELL HARRY
US·13 granted patents·1 pending application·29 citations·filing 2006–2011
Top patents by PatentIndex Score
14 records- 0187US8623588B2Scanning EUV interference imaging for extremely high resolution patterningSEWELL HARRY·Filed 2008·Granted Jan 7, 2014·8 cites·24 claims
- 0279US8629970B2Immersion lithographic apparatus with immersion fluid re-circulating systemSEWELL HARRY·Filed 2009·Granted Jan 14, 2014·5 cites·28 claims
- 0378US8625096B2Method and system for increasing alignment target contrastSEWELL HARRY·Filed 2010·Granted Jan 7, 2014·3 cites·23 claims
- 0476US8817226B2Systems and methods for insitu lens cleaning using ozone in immersion lithographySEWELL HARRY·Filed 2008·Granted Aug 26, 2014·4 cites·7 claims
- 0573US8654311B2Lithographic apparatus and device manufacturing methodSEWELL HARRY·Filed 2009·Granted Feb 18, 2014·3 cites·18 claims
- 0669US8339571B2Lithographic method and apparatusSEWELL HARRY·Filed 2008·Granted Dec 25, 2012·2 cites·38 claims
- 0768US9046754B2EUV mask inspection systemSEWELL HARRY·Filed 2009·Granted Jun 2, 2015·2 cites·14 claims
- 0864US8089609B2Lithographic apparatus and device manufacturing methodSEWELL HARRY·Filed 2008·Granted Jan 3, 2012·1 cites·20 claims
- 0963US8709908B2Improving alignment target contrast in a lithographic double patterning processSEWELL HARRY·Filed 2010·Granted Apr 29, 2014·1 cites·18 claims
- 1052US8736807B2Systems and methods for thermally-induced aberration correction in immersion lithographySEWELL HARRY·Filed 2011·Granted May 27, 2014·0 cites·15 claims
- 1152US8451422B2Re-flow and buffer system for immersion lithographySEWELL HARRY·Filed 2009·Granted May 28, 2013·0 cites·29 claims
- 1251US8456611B2System and method to increase surface tension and contact angle in immersion lithographySEWELL HARRY·Filed 2010·Granted Jun 4, 2013·0 cites·20 claims
- 1347US2007091440A1Method and System for Correction of Intrinsic Birefringence in UV MicrolithographySEWELL HARRY·Filed 2006·Application pending·0 cites
- 1444US8654305B2Systems and methods for insitu lens cleaning in immersion lithographySEWELL HARRY·Filed 2007·Granted Feb 18, 2014·0 cites·15 claims
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