Assignee
SHINDE NINAD
JP·1 granted patent·1 pending application·2 citations·filing 2011–2011
Top patents by PatentIndex Score
2 records- 0158US9029071B2Silicon oxynitride film formation method and substrate equipped with silicon oxynitride film formed therebySHINDE NINAD·Filed 2011·Granted May 12, 2015·2 cites·7 claims
- 0226US2014127630A1Silicon oxynitride film formation method and substrate equipped with silicon oxynitride film formed therebySHINDE NINAD·Filed 2011·Application pending·0 cites
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