Assignee
SHINETSU CHEMICAL CO
JP·5,215 granted patents·1,638 pending applications·55,560 citations·filing 1972–2025
Top patents by PatentIndex Score
6,853 records- 0199US11644753B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted May 9, 2023·6 cites·13 claims
- 0299US7598016B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Oct 6, 2009·107 cites·13 claims
- 0399US6448420B1Acid-decomposable ester compound suitable for use in resist materialSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 10, 2002·160 cites·5 claims
- 0499US6312867B1Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 1999·Granted Nov 6, 2001·209 cites·17 claims
- 0599US5538793ASilicone rubber particles coated with silicone resinSHINETSU CHEMICAL CO·Filed 1994·Granted Jul 23, 1996·385 cites·10 claims
- 0699US5039761AMethacryl function dimethylpolysiloxanes and graft copolymers thereofSHINETSU CHEMICAL CO·Filed 1989·Granted Aug 13, 1991·262 cites·4 claims
- 0799US4988758AFluorosilicone rubber compositionSHINETSU CHEMICAL CO·Filed 1988·Granted Jan 29, 1991·310 cites·8 claims
- 0899US4987169AMethod of preparing silicon compositionsSHINETSU CHEMICAL CO·Filed 1989·Granted Jan 22, 1991·176 cites·16 claims
- 0998US11493843B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Nov 8, 2022·4 cites·13 claims
- 1098US11480870B2Pellicle frame, pellicle, and method for pelling pellicleSHINETSU CHEMICAL CO·Filed 2021·Granted Oct 25, 2022·5 cites·29 claims
- 1198US11422457B2PellicleSHINETSU CHEMICAL CO·Filed 2021·Granted Aug 23, 2022·4 cites·18 claims
- 1298US11415887B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Aug 16, 2022·9 cites·13 claims
- 1398US11397379B2Pellicle frame and pellicleSHINETSU CHEMICAL CO·Filed 2020·Granted Jul 26, 2022·5 cites·27 claims
- 1498US11199768B2Pellicle frame and pellicleSHINETSU CHEMICAL CO·Filed 2020·Granted Dec 14, 2021·5 cites·18 claims
- 1598US10303056B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted May 28, 2019·11 cites·2 claims
- 1698US10295904B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted May 21, 2019·43 cites·17 claims
- 1798US10101654B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted Oct 16, 2018·12 cites·15 claims
- 1898US9608262B2Silicon composite, making method, and non-aqueous electrolyte secondary cell negative electrode materialSHINETSU CHEMICAL CO·Filed 2015·Granted Mar 28, 2017·28 cites·13 claims
- 1998US9250518B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Feb 2, 2016·35 cites·15 claims
- 2098US9091918B2Sulfonium salt, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Jul 28, 2015·58 cites·19 claims
- 2198US7776473B2Silicon-silicon oxide-lithium composite, making method, and non-aqueous electrolyte secondary cell negative electrode materialSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 17, 2010·53 cites·16 claims
- 2298US7771914B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 10, 2010·90 cites·18 claims
- 2398US7771913B2Resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 10, 2010·55 cites·27 claims
- 2498US7670750B2Polymer, resist protective coating material, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Mar 2, 2010·65 cites·25 claims
- 2598US7659003B2Silicone composition and a pressure sensitive adhesive film having a pressure sensitive adhesive layer made from the compositionSHINETSU CHEMICAL CO·Filed 2005·Granted Feb 9, 2010·39 cites·10 claims
- 2698US7569326B2Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 4, 2009·129 cites·11 claims
- 2798US7537880B2Polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted May 26, 2009·258 cites·10 claims
- 2898US7511169B2Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Mar 31, 2009·45 cites·4 claims
- 2998US7485693B2Primer composition for a fluorinated elastomer or a fluorinated gelSHINETSU CHEMICAL CO·Filed 2005·Granted Feb 3, 2009·66 cites·10 claims
- 3098US7455952B2Patterning process and resist overcoat materialSHINETSU CHEMICAL CO·Filed 2005·Granted Nov 25, 2008·63 cites·16 claims
- 3198US7358025B2Photoresist undercoat-forming material and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Apr 15, 2008·55 cites·8 claims
- 3298US7354693B2Polymer, resist protective coating material, and patterning processSHINETSU CHEMICAL CO·Filed 2005·Granted Apr 8, 2008·54 cites·8 claims
- 3398US7307178B2Processes of making γ,δ-unsaturated carboxylic acid and silyl ester thereof, carboxyl group-containing organosilicon compound and process of makingSHINETSU CHEMICAL CO·Filed 2004·Granted Dec 11, 2007·520 cites·7 claims
- 3498US6815352B1Silicon focus ring and method for producing the sameSHINETSU CHEMICAL CO·Filed 2000·Granted Nov 9, 2004·470 cites·2 claims
- 3598US6440634B1Onium salts, photoacid generators for resist compositions, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Aug 27, 2002·76 cites·33 claims
- 3698US6376078B1Spherical fine particles of silicone resinSHINETSU CHEMICAL CO·Filed 2000·Granted Apr 23, 2002·159 cites·20 claims
- 3798US6280898B1Lactone-containing compounds, polymers, resist compositions, and patterning methodSHINETSU CHEMICAL CO·Filed 1999·Granted Aug 28, 2001·229 cites·21 claims
- 3898US6169142B1Thermal conductive silicone rubber compositions and method of makingSHINETSU CHEMICAL CO·Filed 1999·Granted Jan 2, 2001·166 cites·6 claims
- 3998US5755867APhotocatalytic hydrophilic coating compositionsSHINETSU CHEMICAL CO·Filed 1996·Granted May 26, 1998·179 cites·19 claims
- 4098US5236986ASilicone polymers and water-dispersable, pasty silicone oil compositions comprising the sameSHINETSU CHEMICAL CO·Filed 1992·Granted Aug 17, 1993·359 cites·26 claims
- 4198US4803243ABlock-graft copolymerSHINETSU CHEMICAL CO·Filed 1987·Granted Feb 7, 1989·372 cites·4 claims
- 4298US4431789ANovel organopolysiloxane having alcoholic hydroxy groups and a method for the preparation thereofSHINETSU CHEMICAL CO·Filed 1982·Granted Feb 14, 1984·148 cites·5 claims
- 4398US4248993ARoom temperature curable organopolysiloxaneSHINETSU CHEMICAL CO·Filed 1979·Granted Feb 3, 1981·56 cites·5 claims
- 4497US12477709B2Electromagnetic wave shielding sheetSHINETSU CHEMICAL CO·Filed 2023·Granted Nov 18, 2025·1 cites·14 claims
- 4597US11880136B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Jan 23, 2024·3 cites·13 claims
- 4697US11860540B2Positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Jan 2, 2024·3 cites·12 claims
- 4797US11835860B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Dec 5, 2023·3 cites·13 claims
- 4897US11592745B2Positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Feb 28, 2023·4 cites·11 claims
- 4997US11417842B2Conductive polymer composite and conductive polymer compositionSHINETSU CHEMICAL CO·Filed 2020·Granted Aug 16, 2022·4 cites·13 claims
- 5097US11237476B2Pellicle frame and pellicleSHINETSU CHEMICAL CO·Filed 2020·Granted Feb 1, 2022·4 cites·9 claims
Showing the top 50 of 6,853 patent records by PatentIndex Score.
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