Assignee
SK ENPULSE CO LTD
KR·40 granted patents·45 pending applications·4 citations·filing 2018–2025
Top patents by PatentIndex Score
85 records- 0186US12136539B1Semiconductor device fabrication apparatusSK ENPULSE CO LTD·Filed 2024·Granted Nov 5, 2024·1 cites·20 claims
- 0284US11642752B2Porous polyurethane polishing pad and process for preparing the sameSK ENPULSE CO LTD·Filed 2018·Granted May 9, 2023·2 cites·6 claims
- 0378US12481212B2Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2024·Granted Nov 25, 2025·0 cites·16 claims
- 0473US2026049239A1Polishing composition for semiconductor process and method for polishing substrate using sameSK ENPULSE CO LTD·Filed 2025·Application pending·0 cites
- 0570US11931856B2Polishing pad, process for preparing the same, and process for preparing a semiconductor device using the sameSK ENPULSE CO LTD·Filed 2022·Granted Mar 19, 2024·0 cites·6 claims
- 0669US11766759B2Porous polyurethane polishing pad and process for producing the sameSK ENPULSE CO LTD·Filed 2019·Granted Sep 26, 2023·1 cites·14 claims
- 0769US2025018526A1Polishing pad, preparation method thereof and method for preparing semiconductor device using sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 0868US2024263080A1Polishing pad, pyrolysis oil obtained therefrom, and process for preparing the sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 0967US12441911B2Composition for semiconductor processing and polishing method of semiconductor device using the sameSK ENPULSE CO LTD·Filed 2023·Granted Oct 14, 2025·0 cites·16 claims
- 1067US2024345473A1Blank mask and method of fabricating the sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 1166US2024248390A1Apparatus for fabricating blank mask and method of fabricating the sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 1266US2025144767A1Polishing pad with excellent recyclability and pyrolysis oil obtained therefromSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 1366US2025065467A1Eco-friendly polishing pad and manufacturing method thereofSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 1465US2024345467A1Blank mask and method of fabricating the sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 1565US2024248389A1Apparatus for fabricating blank mask and method of fabricating the sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 1664US2025216769A1Blank mask and method of fabricating the sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 1764US2025216768A1Blank mask and method of fabricating the sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 1863US12455501B2Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2022·Granted Oct 28, 2025·0 cites·15 claims
- 1963US2024066661A1Method for manufacturing a polishing sheet and a polishing padSK ENPULSE CO LTD·Filed 2023·Application pending·0 cites
- 2062US12122013B2Composition for polishing pad and polishing padSK ENPULSE CO LTD·Filed 2020·Granted Oct 22, 2024·0 cites·13 claims
- 2161US12529951B2Laminate for blank mask and manufacturing method for the sameSK ENPULSE CO LTD·Filed 2022·Granted Jan 20, 2026·0 cites·12 claims
- 2261US12138738B2Polishing pad, preparation method thereof and method for preparing semiconductor device using sameSK ENPULSE CO LTD·Filed 2021·Granted Nov 12, 2024·0 cites·16 claims
- 2361US2024061324A1Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2023·Application pending·0 cites
- 2461US2024227113A1Polishing pad and method of monitoring a polishing process using the sameSK ENPULSE CO LTD·Filed 2023·Application pending·0 cites
- 2560US2023418150A1Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2023·Application pending·0 cites
- 2659US12480021B2Composition for semiconductor process, method for preparing the same and method for preparing semiconductor device using the sameSK ENPULSE CO LTD·Filed 2023·Granted Nov 25, 2025·0 cites·13 claims
- 2759US12116503B2Polishing composition for semiconductor process and method for manufacturing semiconductor device by using the sameSK ENPULSE CO LTD·Filed 2022·Granted Oct 15, 2024·0 cites·19 claims
- 2859US2025145860A1Polishing composition for semiconductor process and manufacturing method of substrate using the sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 2959US2025145861A1Polishing composition for a semiconductor process and manufacturing method of substrate using the sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 3059US2025136842A1Polishing composition for semiconductor process and method of manufacturing substrate using sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 3158US12522749B2Composition for semiconductor processing and manufacturing method of semiconductor device using the sameSK ENPULSE CO LTD·Filed 2023·Granted Jan 13, 2026·0 cites·15 claims
- 3258US12487517B2Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2022·Granted Dec 2, 2025·0 cites·18 claims
- 3358US12444611B2Semiconductor process polishing composition and polishing method of substrate applied with polishing compositionSK ENPULSE CO LTD·Filed 2021·Granted Oct 14, 2025·0 cites·13 claims
- 3458US2023305382A1Photomask for extreme ultravioletSK ENPULSE CO LTD·Filed 2023·Application pending·0 cites
- 3558US2025145857A1Polishing composition for semiconductor process and method of manufacturing substrate using sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 3658US2025115786A1Polishing composition for semiconductor process and polishing method of substrate using the sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 3758US2025144763A1Polishing pad and process for preparing the sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 3857US12566369B2Method and apparatus for manufacturing a photomask from a blank maskSK ENPULSE CO LTD·Filed 2022·Granted Mar 3, 2026·0 cites·11 claims
- 3957US2024274439A1Polishing composition for semiconductor process and method for polishing a substrate using the sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 4057US2023408903A1Shadow mask and method of manufacturing blank mask using the sameSK ENPULSE CO LTD·Filed 2023·Application pending·0 cites
- 4157US2025115787A1Polishing composition for semiconductor process and polishing method of substrate using the sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 4256US12448543B2Polishing composition for semiconductor process and manufacturing method for polished articleSK ENPULSE CO LTD·Filed 2022·Granted Oct 21, 2025·0 cites·13 claims
- 4356US11724391B2Method and apparatus for determining status of a robotSK ENPULSE CO LTD·Filed 2021·Granted Aug 15, 2023·0 cites·16 claims
- 4456US2023339072A1Conditioning device and method for controlling the conditioning deviceSK ENPULSE CO LTD·Filed 2023·Application pending·0 cites
- 4555US12461439B2Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2022·Granted Nov 4, 2025·0 cites·18 claims
- 4655US12042900B2Polishing system, polishing pad and method of manufacturing semiconductor deviceSK ENPULSE CO LTD·Filed 2022·Granted Jul 23, 2024·0 cites·17 claims
- 4755US2024300066A1Polishing pad and preparing method of semiconductor deviceSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
- 4855US2024140873A1Sintered body and method of manufacturing sintered bodySK ENPULSE CO LTD·Filed 2023·Application pending·0 cites
- 4954US12521839B2Polishing pad and preparing method of semiconductor device using the sameSK ENPULSE CO LTD·Filed 2022·Granted Jan 13, 2026·0 cites·17 claims
- 5054US2025033160A1Polishing pad with reduced defect and method of preparing a semiconductor device using the sameSK ENPULSE CO LTD·Filed 2024·Application pending·0 cites
Showing the top 50 of 85 patent records by PatentIndex Score.
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