Assignee
TBW IND INC
US·13 granted patents·2 pending applications·221 citations·filing 1976–2011
Top patents by PatentIndex Score
15 records- 0194US7040967B2Multi-step, in-situ pad conditioning system and method for chemical mechanical planarizationTBW IND INC·Filed 2005·Granted May 9, 2006·34 cites·24 claims
- 0292US7575503B2Vacuum-assisted pad conditioning systemTBW IND INC·Filed 2007·Granted Aug 18, 2009·19 cites·20 claims
- 0392US7544113B1Apparatus for controlling the forces applied to a vacuum-assisted pad conditioning systemTBW IND INC·Filed 2005·Granted Jun 9, 2009·19 cites·6 claims
- 0491US7217172B2Enhanced end effector arm arrangement for CMP pad conditioningTBW IND INC·Filed 2006·Granted May 15, 2007·19 cites·12 claims
- 0590US7909910B2Vacuum line clean-out separator systemTBW IND INC·Filed 2007·Granted Mar 22, 2011·21 cites·16 claims
- 0687US7258600B1Vacuum-assisted pad conditioning systemTBW IND INC·Filed 2004·Granted Aug 21, 2007·33 cites·15 claims
- 0785US7901267B1Method for controlling the forces applied to a vacuum-assisted pad conditioning systemTBW IND INC·Filed 2009·Granted Mar 8, 2011·8 cites·3 claims
- 0878US8025555B1System for measuring and controlling the level of vacuum applied to a conditioning holder within a CMP systemTBW IND INC·Filed 2011·Granted Sep 27, 2011·3 cites·2 claims
- 0975US7166014B2Chemical mechanical planarization process control utilizing in-situ conditioning processTBW IND INC·Filed 2005·Granted Jan 23, 2007·6 cites·14 claims
- 1074US7052371B2Vacuum-assisted pad conditioning system and method utilizing an apertured conditioning diskTBW IND INC·Filed 2003·Granted May 30, 2006·13 cites·15 claims
- 1166US7913705B2Cleaning cup system for chemical mechanical planarization apparatusTBW IND INC·Filed 2008·Granted Mar 29, 2011·3 cites·8 claims
- 1260US4199298ATrailer for skid mounted tanksTBW IND INC·Filed 1977·Granted Apr 22, 1980·25 cites·1 claims
- 1357US4088373AHigh volume pneumatic tankTBW IND INC·Filed 1976·Granted May 9, 1978·18 cites·1 claims
- 1445US2008160883A1Abrasive configuration for fluid dynamic removal of abraded material and the likeTBW IND INC·Filed 2007·Application pending·0 cites
- 1543US2007087672A1Apertured conditioning brush for chemical mechanical planarization systemsTBW IND INC·Filed 2006·Application pending·0 cites
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