Assignee
TOKYO ELECTRON AT LTD
JP·3 granted patents·165 citations·filing 1999–2003
Top patents by PatentIndex Score
3 records- 0187US6676804B1Method and apparatus for plasma processingTOKYO ELECTRON AT LTD·Filed 1999·Granted Jan 13, 2004·82 cites·10 claims
- 0285US6297064B1End point detecting method for semiconductor plasma processingTOKYO ELECTRON AT LTD·Filed 1999·Granted Oct 2, 2001·75 cites·17 claims
- 0364US7335278B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON AT LTD·Filed 2003·Granted Feb 26, 2008·8 cites·5 claims
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