Assignee
TOKYO OHKA KOGYA CO LTD
JP·4 granted patents·54 citations·filing 1995–2005
Top patents by PatentIndex Score
4 records- 0179US5939510AUndercoating composition for photolithographic resistTOKYO OHKA KOGYA CO LTD·Filed 1997·Granted Aug 17, 1999·38 cites·6 claims
- 0267US7381270B2Slit nozzle and apparatus for supplying treatment liquid using slit nozzleTOKYO OHKA KOGYA CO LTD·Filed 2005·Granted Jun 3, 2008·2 cites·17 claims
- 0344US6207788B1Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resinTOKYO OHKA KOGYA CO LTD·Filed 1998·Granted Mar 27, 2001·8 cites·1 claims
- 0441US5753421AStock developer solutions for photoresists and developer solutions prepared by dilution thereofTOKYO OHKA KOGYA CO LTD·Filed 1995·Granted May 19, 1998·6 cites·12 claims
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