Assignee
TSUBAKI HIDEAKI
JP·13 granted patents·2 pending applications·351 citations·filing 2007–2012
Top patents by PatentIndex Score
15 records- 0199US8227183B2Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming methodTSUBAKI HIDEAKI·Filed 2007·Granted Jul 24, 2012·88 cites·29 claims
- 0299US8088557B2Method of forming patternsTSUBAKI HIDEAKI·Filed 2010·Granted Jan 3, 2012·79 cites·17 claims
- 0399US8071272B2Method of forming patternsTSUBAKI HIDEAKI·Filed 2010·Granted Dec 6, 2011·87 cites·20 claims
- 0495US8951718B2Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming methodTSUBAKI HIDEAKI·Filed 2012·Granted Feb 10, 2015·7 cites·21 claims
- 0594US8642253B2Resist composition for negative tone development and pattern forming method using the sameTSUBAKI HIDEAKI·Filed 2010·Granted Feb 4, 2014·9 cites·19 claims
- 0693US8546063B2Organic solvent development or multiple development pattern-forming method using electron beams or EUV raysTSUBAKI HIDEAKI·Filed 2010·Granted Oct 1, 2013·10 cites·33 claims
- 0793US8241840B2Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming methodTSUBAKI HIDEAKI·Filed 2010·Granted Aug 14, 2012·50 cites·15 claims
- 0889US8530148B2Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming methodTSUBAKI HIDEAKI·Filed 2008·Granted Sep 10, 2013·10 cites·13 claims
- 0987US8632942B2Method of forming patternsTSUBAKI HIDEAKI·Filed 2011·Granted Jan 21, 2014·4 cites·22 claims
- 1084US8617794B2Method of forming patternsTSUBAKI HIDEAKI·Filed 2011·Granted Dec 31, 2013·4 cites·39 claims
- 1175US8476001B2Pattern forming methodTSUBAKI HIDEAKI·Filed 2011·Granted Jul 2, 2013·2 cites·17 claims
- 1265US8637229B2Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming methodTSUBAKI HIDEAKI·Filed 2010·Granted Jan 28, 2014·1 cites·9 claims
- 1358US2012058436A1Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming methodTSUBAKI HIDEAKI·Filed 2011·Application pending·0 cites
- 1449US9046782B2Resist composition for negative tone development and pattern forming method using the sameTSUBAKI HIDEAKI·Filed 2008·Granted Jun 2, 2015·0 cites·35 claims
- 1536US2012003585A1Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the compositionTSUBAKI HIDEAKI·Filed 2010·Application pending·0 cites
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →