Assignee
TSUCHIMURA TOMOTAKA
JP·9 granted patents·1 pending application·35 citations·filing 2008–2012
Top patents by PatentIndex Score
10 records- 0197US8900791B2Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the compositionTSUCHIMURA TOMOTAKA·Filed 2011·Granted Dec 2, 2014·23 cites·21 claims
- 0289US9223208B2Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the compositionTSUCHIMURA TOMOTAKA·Filed 2011·Granted Dec 29, 2015·6 cites·15 claims
- 0376US8637220B2Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the compositionTSUCHIMURA TOMOTAKA·Filed 2011·Granted Jan 28, 2014·2 cites·14 claims
- 0470US8728686B2Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursorsTSUCHIMURA TOMOTAKA·Filed 2008·Granted May 20, 2014·2 cites·28 claims
- 0566US8808961B2Composition, resist film, pattern forming method, and inkjet recording methodTSUCHIMURA TOMOTAKA·Filed 2010·Granted Aug 19, 2014·1 cites·15 claims
- 0664US8741542B2Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the sameTSUCHIMURA TOMOTAKA·Filed 2010·Granted Jun 3, 2014·1 cites·11 claims
- 0747US8778593B2Chemical amplification resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the compositionTSUCHIMURA TOMOTAKA·Filed 2012·Granted Jul 15, 2014·0 cites·15 claims
- 0846US8614033B2Resist film, resist coated mask blanks and method of forming resist pattern using the resist film, and chemical amplification type resist compositionTSUCHIMURA TOMOTAKA·Filed 2012·Granted Dec 24, 2013·0 cites·20 claims
- 0941US2011318691A1Resist composition for semiconductor, and resist film and pattern forming method using the sameTSUCHIMURA TOMOTAKA·Filed 2011·Application pending·0 cites
- 1037US8895222B2Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the compositionTSUCHIMURA TOMOTAKA·Filed 2010·Granted Nov 25, 2014·0 cites·10 claims
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