Assignee
WANG DEYAN
US·22 granted patents·1 pending application·69 citations·filing 2006–2019
Top patents by PatentIndex Score
23 records- 0197US8241832B2Compositions and processes for photolithographyWANG DEYAN·Filed 2009·Granted Aug 14, 2012·25 cites·9 claims
- 0291US8257902B2Compositons and processes for immersion lithographyWANG DEYAN·Filed 2008·Granted Sep 4, 2012·10 cites·10 claims
- 0390US8262891B2Leveler compoundsWANG DEYAN·Filed 2006·Granted Sep 11, 2012·7 cites·7 claims
- 0489US8871428B2Compositions and processes for immersion lithographyWANG DEYAN·Filed 2012·Granted Oct 28, 2014·4 cites·6 claims
- 0589US8506788B2Leveler compoundsWANG DEYAN·Filed 2012·Granted Aug 13, 2013·3 cites·7 claims
- 0687US8715902B2Compositions and processes for immersion lithographyWANG DEYAN·Filed 2009·Granted May 6, 2014·6 cites·21 claims
- 0785US8722825B2Surface active additive and photoresist composition comprising sameWANG DEYAN·Filed 2012·Granted May 13, 2014·4 cites·6 claims
- 0884US8883400B2Compositions and processes for photolithographyWANG DEYAN·Filed 2012·Granted Nov 11, 2014·2 cites·16 claims
- 0981US9696622B2Compositions and processes for immersion lithographyWANG DEYAN·Filed 2011·Granted Jul 4, 2017·2 cites·33 claims
- 1067US9122159B2Compositions and processes for photolithographyWANG DEYAN·Filed 2012·Granted Sep 1, 2015·1 cites·15 claims
- 1165US9436082B2Compositions comprising base-reactive component and processes for photolithographyWANG DEYAN·Filed 2011·Granted Sep 6, 2016·1 cites·9 claims
- 1265US9005880B2Compositions comprising sulfonamide material and processes for photolithographyWANG DEYAN·Filed 2009·Granted Apr 14, 2015·1 cites·12 claims
- 1365US8975006B2Compositions comprising carboxy component and processes for photolithographyWANG DEYAN·Filed 2009·Granted Mar 10, 2015·1 cites·6 claims
- 1464US8748080B2Compositions and processes for photolithographyWANG DEYAN·Filed 2009·Granted Jun 10, 2014·1 cites·10 claims
- 1561US2019346763A1Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithographyWANG DEYAN·Filed 2019·Application pending·0 cites
- 1659US10359698B2Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithographyWANG DEYAN·Filed 2009·Granted Jul 23, 2019·0 cites·8 claims
- 1757US8808967B2Compositions and processes for photolithographyWANG DEYAN·Filed 2012·Granted Aug 19, 2014·0 cites·15 claims
- 1854US9958780B2Coating compositions for photoresistsWANG DEYAN·Filed 2010·Granted May 1, 2018·0 cites·19 claims
- 1951US9507260B2Compositions and processes for photolithographyWANG DEYAN·Filed 2009·Granted Nov 29, 2016·0 cites·2 claims
- 2047US11106137B2Compositions comprising base-reactive component and processes for photolithographyWANG DEYAN·Filed 2011·Granted Aug 31, 2021·0 cites·12 claims
- 2144US9696627B2Compositions comprising base-reactive component and processes for photolithographyWANG DEYAN·Filed 2010·Granted Jul 4, 2017·0 cites·18 claims
- 2243US8158325B2Compositions and processes for photolithographyWANG DEYAN·Filed 2006·Granted Apr 17, 2012·1 cites·14 claims
- 2335US10180627B2Processes for photolithographyWANG DEYAN·Filed 2010·Granted Jan 15, 2019·0 cites·15 claims
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