Assignee
WATANABE TAKERU
JP·9 granted patents·32 citations·filing 2009–2012
Top patents by PatentIndex Score
9 records- 0190US8431323B2Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning processWATANABE TAKERU·Filed 2009·Granted Apr 30, 2013·7 cites·28 claims
- 0289US8329384B2Resist-modifying composition and pattern forming processWATANABE TAKERU·Filed 2010·Granted Dec 11, 2012·10 cites·10 claims
- 0386US8658346B2Pattern forming process, chemically amplified positive resist composition, and resist-modifying compositionWATANABE TAKERU·Filed 2010·Granted Feb 25, 2014·6 cites·15 claims
- 0479US8835092B2Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivativeWATANABE TAKERU·Filed 2011·Granted Sep 16, 2014·3 cites·13 claims
- 0574US8628908B2Chemically amplified resist composition and patterning processWATANABE TAKERU·Filed 2012·Granted Jan 14, 2014·2 cites·8 claims
- 0673US8426105B2Resist-modifying composition and pattern forming processWATANABE TAKERU·Filed 2010·Granted Apr 23, 2013·2 cites·11 claims
- 0771US9076738B2Composition for resist underlayer film, process for forming resist underlayer film, patterning process, and fullerene derivativeWATANABE TAKERU·Filed 2011·Granted Jul 7, 2015·2 cites·33 claims
- 0856US8216766B2Polymer, polymer preparation method, resist composition and patterning processWATANABE TAKERU·Filed 2009·Granted Jul 10, 2012·0 cites·14 claims
- 0948US8426110B2Chemically amplified positive resist composition, patterning process, and acid-decomposable keto ester compoundWATANABE TAKERU·Filed 2012·Granted Apr 23, 2013·0 cites·7 claims
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