Assignee

WON MI-SOOK

KR·1 granted patent·3 citations·filing 2009–2009

Technology mixH01F1 H01J1

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0155US8461763B2Electron cyclotron ion source and manufacturing method thereofWON MI-SOOK·Filed 2009·Granted Jun 11, 2013·3 cites·12 claims

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