Assignee

WU WEI CHING

TW·1 granted patent·3 citations·filing 2011–2011

Technology mixC23C1 H01J1

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0183US9941100B2Adjustable nozzle for plasma deposition and a method of controlling the adjustable nozzleWU WEI CHING·Filed 2011·Granted Apr 10, 2018·3 cites·14 claims

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