Assignee
YOKOI SHIGERU
JP·5 granted patents·16 pending applications·7 citations·filing 2005–2011
Top patents by PatentIndex Score
21 records- 0175US8192923B2Photoresist stripping solution and a method of stripping photoresists using the sameYOKOI SHIGERU·Filed 2007·Granted Jun 5, 2012·3 cites·12 claims
- 0274US8158568B2Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewithYOKOI SHIGERU·Filed 2010·Granted Apr 17, 2012·1 cites·9 claims
- 0372US8685910B2Cleaning liquid used in photolithography and a method for treating substrate therewithYOKOI SHIGERU·Filed 2010·Granted Apr 1, 2014·1 cites·10 claims
- 0467US8114825B2Photoresist stripping solutionYOKOI SHIGERU·Filed 2009·Granted Feb 14, 2012·1 cites·9 claims
- 0564US8803026B2Laser machining device and bellows deviceYOKOI SHIGERU·Filed 2011·Granted Aug 12, 2014·1 cites·10 claims
- 0659US2010112495A1Photoresist stripping solution and a method of stripping photoresists using the sameYOKOI SHIGERU·Filed 2009·Application pending·0 cites
- 0759US2010051582A1Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewithYOKOI SHIGERU·Filed 2009·Application pending·0 cites
- 0858US2009156005A1Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewithYOKOI SHIGERU·Filed 2009·Application pending·0 cites
- 0958US2009291565A1Method for stripping photoresistYOKOI SHIGERU·Filed 2009·Application pending·0 cites
- 1057US2008280452A1Method for stripping photoresistYOKOI SHIGERU·Filed 2008·Application pending·0 cites
- 1157US2008241758A1Photoresist stripping solution and a method of stripping photoresists using the sameYOKOI SHIGERU·Filed 2008·Application pending·0 cites
- 1255US2007298619A1Method for stripping photoresistYOKOI SHIGERU·Filed 2007·Application pending·0 cites
- 1355US2007243494A1Photoresist stripping solution and a method of stripping photoresists using the sameYOKOI SHIGERU·Filed 2007·Application pending·0 cites
- 1453US2007003859A1Photoresist stripping solution and a method of stripping photoresists using the sameYOKOI SHIGERU·Filed 2006·Application pending·0 cites
- 1553US2006241012A1Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewithYOKOI SHIGERU·Filed 2006·Application pending·0 cites
- 1652US2007027052A1Cleaning liquid used in photolithography and a method for treating substrate therewithYOKOI SHIGERU·Filed 2006·Application pending·0 cites
- 1752US2007078072A1Photoresist stripping solutionYOKOI SHIGERU·Filed 2006·Application pending·0 cites
- 1852US2006035176A1Photoresist stripping solution and a method of stripping photoresists using the sameYOKOI SHIGERU·Filed 2005·Application pending·0 cites
- 1952US2007037087A1Photoresist stripping solution and a method of stripping photoresists using the sameYOKOI SHIGERU·Filed 2006·Application pending·0 cites
- 2049US2007105035A1Photoresist stripping solution and method of treating substrate with the sameYOKOI SHIGERU·Filed 2006·Application pending·0 cites
- 2146US2006063688A1Photoresist stripping solution and method of treating substrate with the sameYOKOI SHIGERU·Filed 2005·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when YOKOI SHIGERU files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →