Assignee
YOUNG CHANG CHEMICAL CO LTD
KR·29 granted patents·4 pending applications·2 citations·filing 2013–2021
Top patents by PatentIndex Score
33 records- 0182US10162261B2Negative photoresist composition for KrF laser for forming semiconductor patternsYOUNG CHANG CHEMICAL CO LTD·Filed 2016·Granted Dec 25, 2018·2 cites·7 claims
- 0268US11473035B2Process solution composition for extreme ultraviolet lithography, and method for forming pattern by using sameYOUNG CHANG CHEMICAL CO LTD·Filed 2019·Granted Oct 18, 2022·0 cites·3 claims
- 0365US11001780B2Cutting oil compositionYOUNG CHANG CHEMICAL CO LTD·Filed 2018·Granted May 11, 2021·0 cites·5 claims
- 0460US12050403B2Organic-inorganic hybrid photoresist processing liquid compositionYOUNG CHANG CHEMICAL CO LTD·Filed 2019·Granted Jul 30, 2024·0 cites·3 claims
- 0560US11199779B2Developer composition, for EUV light source, for forming photosensitive photoresist micropatternYOUNG CHANG CHEMICAL CO LTD·Filed 2019·Granted Dec 14, 2021·0 cites·2 claims
- 0658US12398342B2Process liquid composition for lithography and pattern forming method using sameYOUNG CHANG CHEMICAL CO LTD·Filed 2020·Granted Aug 26, 2025·0 cites·5 claims
- 0758US10844335B2Composition for performing cleaning after chemical/ mechanical polishingYOUNG CHANG CHEMICAL CO LTD·Filed 2018·Granted Nov 24, 2020·0 cites·3 claims
- 0857US11624984B2Process liquid composition for extreme ultraviolet lithography and pattern forming method using sameYOUNG CHANG CHEMICAL CO LTD·Filed 2019·Granted Apr 11, 2023·0 cites·7 claims
- 0956US12105421B2Highly thick spin-on-carbon hard mask composition and patterning method using sameYOUNG CHANG CHEMICAL CO LTD·Filed 2020·Granted Oct 1, 2024·0 cites·7 claims
- 1056US11555150B2Etching composition for silicon nitride filmYOUNG CHANG CHEMICAL CO LTD·Filed 2020·Granted Jan 17, 2023·0 cites·12 claims
- 1155US11169442B2EUV developer composition for forming photosensitive photoresist micropatternYOUNG CHANG CHEMICAL CO LTD·Filed 2018·Granted Nov 9, 2021·0 cites·10 claims
- 1255US2023350293A1I-line negative photoresist composition for reducing height difference between center and edge and reducing ler, and i-line negative photoresist composition for improving process marginYOUNG CHANG CHEMICAL CO LTD·Filed 2021·Application pending·0 cites
- 1354US11487208B2Process liquid for extreme ultraviolet lithography and pattern forming method using sameYOUNG CHANG CHEMICAL CO LTD·Filed 2019·Granted Nov 1, 2022·0 cites·14 claims
- 1454US11169444B2Method and composition for improving LWR in patterning step using negative tone photoresistYOUNG CHANG CHEMICAL CO LTD·Filed 2017·Granted Nov 9, 2021·0 cites·3 claims
- 1554US9884970B2Coating composition for preventing collapse of capacitorYOUNG CHANG CHEMICAL CO LTD·Filed 2013·Granted Feb 6, 2018·0 cites·3 claims
- 1653US11187985B2Method and composition for improving LWR in patterning step using negative tone photoresistYOUNG CHANG CHEMICAL CO LTD·Filed 2017·Granted Nov 30, 2021·0 cites·3 claims
- 1752US12305080B2Slurry composition for polishing silicon oxide film, and polishing method using sameYOUNG CHANG CHEMICAL CO LTD·Filed 2020·Granted May 20, 2025·0 cites·6 claims
- 1852US11036134B2High etch resistance spin-on carbon hard mask composition and patterning method using sameYOUNG CHANG CHEMICAL CO LTD·Filed 2017·Granted Jun 15, 2021·0 cites·14 claims
- 1952US10717878B2Anti-reflection coating composition and anti-reflection film utilizing sameYOUNG CHANG CHEMICAL CO LTD·Filed 2017·Granted Jul 21, 2020·0 cites·8 claims
- 2052US2022342313A1Process liquid composition for photolithography and pattern forming method using sameYOUNG CHANG CHEMICAL CO LTD·Filed 2020·Application pending·0 cites
- 2151US11586109B2Chemically-amplified-type negative-type photoresist compositionYOUNG CHANG CHEMICAL CO LTD·Filed 2017·Granted Feb 21, 2023·0 cites·5 claims
- 2251US11488834B2Method for forming silicon or silicon compound pattern in semiconductor manufacturing processYOUNG CHANG CHEMICAL CO LTD·Filed 2020·Granted Nov 1, 2022·0 cites·12 claims
- 2350US2023266672A1Process solution composition for extreme ultraviolet photolithography and pattern forming method using sameYOUNG CHANG CHEMICAL CO LTD·Filed 2021·Application pending·0 cites
- 2449US11315788B2Etching method for forming micro silicon pattern in semiconductor manufacturing processYOUNG CHANG CHEMICAL CO LTD·Filed 2019·Granted Apr 26, 2022·0 cites·7 claims
- 2548US11970672B2Cleaning liquid composition for semiconductor wafer and cleaning method using sameYOUNG CHANG CHEMICAL CO LTD·Filed 2020·Granted Apr 30, 2024·0 cites·6 claims
- 2647US12094719B2Etching pattern forming method in semiconductor manufacturing processYOUNG CHANG CHEMICAL CO LTD·Filed 2020·Granted Sep 17, 2024·0 cites·4 claims
- 2747US11294287B2Photoresist pattern shrinking composition and pattern shrinking methodYOUNG CHANG CHEMICAL CO LTD·Filed 2017·Granted Apr 5, 2022·0 cites·3 claims
- 2847US10539871B2I-line negative type photoresist composition having excellent etching resistanceYOUNG CHANG CHEMICAL CO LTD·Filed 2016·Granted Jan 21, 2020·0 cites·8 claims
- 2947US2023295500A1Etchant composition for adjusting etching selectivity of titanium nitride film with respect to tungsten film, and etching method using sameYOUNG CHANG CHEMICAL CO LTD·Filed 2021·Application pending·0 cites
- 3045US11906900B2Chemically amplified positive photoresist composition for improving pattern profileYOUNG CHANG CHEMICAL CO LTD·Filed 2019·Granted Feb 20, 2024·0 cites·4 claims
- 3145US10775699B2Negative photoresist composition for KRF laser, having high resolution and high aspect ratioYOUNG CHANG CHEMICAL CO LTD·Filed 2017·Granted Sep 15, 2020·0 cites·4 claims
- 3244US10526508B2Slurry composition for CMP and polishing method using sameYOUNG CHANG CHEMICAL CO LTD·Filed 2016·Granted Jan 7, 2020·0 cites·11 claims
- 3341US9829797B2Cleaning composition for photolithography and method of forming photoresist pattern using the sameYOUNG CHANG CHEMICAL CO LTD·Filed 2016·Granted Nov 28, 2017·0 cites·5 claims
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