Assignee
ZEISS CARL SMT AG
DE·436 granted patents·204 pending applications·7,091 citations·filing 1999–2011
Top patents by PatentIndex Score
640 records- 0199US7442908B2Method for optically detecting deviations of an image plane of an imaging system from the surface of a substrateZEISS CARL SMT AG·Filed 2005·Granted Oct 28, 2008·87 cites·18 claims
- 0299US7312847B2Refractive projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2005·Granted Dec 25, 2007·84 cites·47 claims
- 0399US6891596B2Refractive projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2003·Granted May 10, 2005·174 cites·113 claims
- 0499US6658084B2Illumination system with variable adjustment of the illuminationZEISS CARL SMT AG·Filed 2001·Granted Dec 2, 2003·179 cites·52 claims
- 0598US7414781B2Catoptric objectives and systems using catoptric objectivesZEISS CARL SMT AG·Filed 2006·Granted Aug 19, 2008·64 cites·50 claims
- 0698US7382540B2Refractive projection objectiveZEISS CARL SMT AG·Filed 2007·Granted Jun 3, 2008·105 cites·3 claims
- 0798US7339743B2Very-high aperture projection objectiveZEISS CARL SMT AG·Filed 2006·Granted Mar 4, 2008·114 cites·35 claims
- 0898US7203008B2Very high-aperture projection objectiveZEISS CARL SMT AG·Filed 2004·Granted Apr 10, 2007·107 cites·51 claims
- 0998US7190527B2Refractive projection objectiveZEISS CARL SMT AG·Filed 2004·Granted Mar 13, 2007·161 cites·57 claims
- 1098US6878916B2Method for focus detection for optically detecting deviation of the image plane of a projection lens from the upper surface of a substrate, and an imaging system with a focus-detection systemZEISS CARL SMT AG·Filed 2002·Granted Apr 12, 2005·153 cites·45 claims
- 1197US7682031B2Catoptric objectives and systems using catoptric objectivesZEISS CARL SMT AG·Filed 2005·Granted Mar 23, 2010·48 cites·49 claims
- 1297US7227616B2Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Jun 5, 2007·63 cites·11 claims
- 1397US7209286B2Objective with pupil obscurationZEISS CARL SMT AG·Filed 2005·Granted Apr 24, 2007·32 cites·17 claims
- 1497US7199922B2Reflective projection lens for EUV-photolithographyZEISS CARL SMT AG·Filed 2005·Granted Apr 3, 2007·26 cites·6 claims
- 1597US6894834B2Objective with pupil obscurationZEISS CARL SMT AG·Filed 2003·Granted May 17, 2005·90 cites·47 claims
- 1697US6891683B2Refractive projection objective with a waistZEISS CARL SMT AG·Filed 2003·Granted May 10, 2005·128 cites·32 claims
- 1796US7605926B1Optical system, method of manufacturing an optical system and method of manufacturing an optical elementZEISS CARL SMT AG·Filed 2008·Granted Oct 20, 2009·47 cites·6 claims
- 1896US7359036B2Imaging system, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2006·Granted Apr 15, 2008·27 cites·22 claims
- 1996US7190530B2Projection objectives including a plurality of mirrors with lenses ahead of mirror M3ZEISS CARL SMT AG·Filed 2006·Granted Mar 13, 2007·56 cites·23 claims
- 2096US7092069B2Projection exposure method and projection exposure systemZEISS CARL SMT AG·Filed 2004·Granted Aug 15, 2006·95 cites·40 claims
- 2196US7085075B2Projection objectives including a plurality of mirrors with lenses ahead of mirror M3ZEISS CARL SMT AG·Filed 2003·Granted Aug 1, 2006·82 cites·52 claims
- 2295US7847921B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2008·Granted Dec 7, 2010·30 cites·7 claims
- 2395US7830611B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted Nov 9, 2010·34 cites·48 claims
- 2495US7760366B2System for measuring the image quality of an optical imaging systemZEISS CARL SMT AG·Filed 2008·Granted Jul 20, 2010·34 cites·17 claims
- 2595US7551261B2Illumination system for a microlithography projection exposure installationZEISS CARL SMT AG·Filed 2005·Granted Jun 23, 2009·24 cites·20 claims
- 2695US7511886B2Optical beam transformation system and illumination system comprising an optical beam transformation systemZEISS CARL SMT AG·Filed 2005·Granted Mar 31, 2009·63 cites·54 claims
- 2795US7426082B2Catadioptric projection objective with geometric beam splittingZEISS CARL SMT AG·Filed 2005·Granted Sep 16, 2008·20 cites·22 claims
- 2895US7408616B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2004·Granted Aug 5, 2008·70 cites·44 claims
- 2995US7237915B2Catadioptric projection system for 157 nm lithographyZEISS CARL SMT AG·Filed 2004·Granted Jul 3, 2007·52 cites·29 claims
- 3095US7203010B2Catadioptric projection objectiveZEISS CARL SMT AG·Filed 2005·Granted Apr 10, 2007·21 cites·24 claims
- 3195US7187503B2Refractive projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2004·Granted Mar 6, 2007·68 cites·48 claims
- 3295US6927901B2Reflective projection lens for EUV-photolithographyZEISS CARL SMT AG·Filed 2002·Granted Aug 9, 2005·54 cites·18 claims
- 3395US6856379B2Polarizer and microlithography projection system with a polarizerZEISS CARL SMT AG·Filed 2002·Granted Feb 15, 2005·81 cites·63 claims
- 3495US6710917B28-mirror microlithography projection objectiveZEISS CARL SMT AG·Filed 2001·Granted Mar 23, 2004·88 cites·29 claims
- 3594US7385756B2Catadioptric projection objectiveZEISS CARL SMT AG·Filed 2005·Granted Jun 10, 2008·42 cites·109 claims
- 3694US7256932B2Optical system for ultraviolet lightZEISS CARL SMT AG·Filed 2005·Granted Aug 14, 2007·38 cites·32 claims
- 3794US7233386B2Method of optimizing imaging performanceZEISS CARL SMT AG·Filed 2005·Granted Jun 19, 2007·16 cites·33 claims
- 3894US7209292B2Projection objective, especially for microlithography, and method for adjusting a projection objectiveZEISS CARL SMT AG·Filed 2003·Granted Apr 24, 2007·56 cites·99 claims
- 3994US7145720B2Objective with fluoride crystal lensesZEISS CARL SMT AG·Filed 2003·Granted Dec 5, 2006·49 cites·97 claims
- 4093US7817248B2Optical imaging arrangementZEISS CARL SMT AG·Filed 2007·Granted Oct 19, 2010·14 cites·18 claims
- 4193US7796274B2System for measuring the image quality of an optical imaging systemZEISS CARL SMT AG·Filed 2005·Granted Sep 14, 2010·21 cites·34 claims
- 4293US7738187B2Optical element, projection lens and associated projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted Jun 15, 2010·48 cites·31 claims
- 4393US7738193B2Positioning unit and alignment device for an optical elementZEISS CARL SMT AG·Filed 2005·Granted Jun 15, 2010·11 cites·39 claims
- 4493US7570343B2Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Aug 4, 2009·14 cites·8 claims
- 4593US7489441B2Monocrystalline optical component with curved surface and multilayer coatingZEISS CARL SMT AG·Filed 2005·Granted Feb 10, 2009·277 cites·9 claims
- 4693US7473907B2Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illuminationZEISS CARL SMT AG·Filed 2005·Granted Jan 6, 2009·26 cites·29 claims
- 4793US7463422B2Projection exposure apparatusZEISS CARL SMT AG·Filed 2007·Granted Dec 9, 2008·19 cites·23 claims
- 4893US7460206B2Projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2004·Granted Dec 2, 2008·71 cites·3 claims
- 4993US7375798B2Projection system for EUV lithographyZEISS CARL SMT AG·Filed 2007·Granted May 20, 2008·25 cites·17 claims
- 5093US7355678B2Projection system for EUV lithographyZEISS CARL SMT AG·Filed 2005·Granted Apr 8, 2008·25 cites·20 claims
Showing the top 50 of 640 patent records by PatentIndex Score.
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