Inventor · disambiguated record
Woo-Chan Jung
Also filed as: JUNG WOO-CHAN
6 granted patents·1 pending application·131 citations·filing 2001–2003
83Inventor score
Technology areasH10P
Files withSAMSUNG ELECTRONICS CO LTD6
Top patents by PatentIndex Score
7 records- 0192US6867141B2Method for fabricating semiconductor device and forming interlayer dielectric film using high-density plasmaSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Mar 15, 2005·83 cites·25 claims
- 0281US6599792B2Semiconductor device and method for manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Jul 29, 2003·26 cites·16 claims
- 0374US6617259B2Method for fabricating semiconductor device and forming interlayer dielectric film using high-density plasmaSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Sep 9, 2003·16 cites·11 claims
- 0454US6841851B2Semiconductor device having a high density plasma oxide layerSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jan 11, 2005·4 cites·8 claims
- 0546US6730619B2Method of manufacturing insulating layer and semiconductor device including insulating layerSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted May 4, 2004·2 cites·28 claims
- 0640US7180129B2Semiconductor device including insulating layerSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Feb 20, 2007·0 cites·7 claims
- 0732US2002068467A1Method of fabricating PE-SiON filmFiled 2001·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →