Inventor
RULKENS RON
US22 patents
⚠️ This page may combine multiple inventors who share the name “RULKENS RON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NOVELLUS SYSTEMS INC
13 patentsUS7790633B1Sep 7, 2010
Sequential deposition/anneal film densification method
NOVELLUS SYSTEMS INC643 citations98
US7482247B1Jan 27, 2009
Conformal nanolaminate dielectric deposition and etch bag gap fill process
NOVELLUS SYSTEMS INC583 citations98
US7148155B1Dec 12, 2006
Sequential deposition/anneal film densification method
NOVELLUS SYSTEMS INC416 citations98
US7297608B1Nov 20, 2007
Method for controlling properties of conformal silica nanolaminates formed by rapid vapor deposition
NOVELLUS SYSTEMS INC68 citations97
US7294583B1Nov 13, 2007
Methods for the use of alkoxysilanol precursors for vapor deposition of SiO2 films
NOVELLUS SYSTEMS INC18 citations92
US7271112B1Sep 18, 2007
Methods for forming high density, conformal, silica nanolaminate films via pulsed deposition layer in structures of confined geometry
NOVELLUS SYSTEMS INC25 citations92
US7202185B1Apr 10, 2007
Silica thin films produced by rapid surface catalyzed vapor deposition (RVD) using a nucleation layer
NOVELLUS SYSTEMS INC48 citations92
US7129189B1Oct 31, 2006
Aluminum phosphate incorporation in silica thin films produced by rapid surface catalyzed vapor deposition (RVD)
NOVELLUS SYSTEMS INC26 citations92
US7097878B1Aug 29, 2006
Mixed alkoxy precursors and methods of their use for rapid vapor deposition of SiO2 films
NOVELLUS SYSTEMS INC35 citations92
US6762849B1Jul 13, 2004
Method for in-situ film thickness measurement and its use for in-situ control of deposited film thickness
NOVELLUS SYSTEMS INC45 citations92
US6919279B1Jul 19, 2005
Endpoint detection for high density plasma (HDP) processes
NOVELLUS SYSTEMS INC28 citations86
US7223707B1May 29, 2007
Dynamic rapid vapor deposition process for conformal silica laminates
NOVELLUS SYSTEMS INC10 citations84
US7491653B1Feb 17, 2009
Metal-free catalysts for pulsed deposition layer process for conformal silica laminates
NOVELLUS SYSTEMS INC7 citations74