Inventor
YOTSUYA SHINICHI
JP48 patents
⚠️ This page may combine multiple inventors who share the name “YOTSUYA SHINICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEIKO EPSON CORP
46 patentsUS6650461B2Nov 18, 2003
Method of manufacturing spatial light modulator and electronic device employing it
SEIKO EPSON CORP85 citations99
US6452712B2Sep 17, 2002
Method of manufacturing spatial light modulator and electronic device employing it
SEIKO EPSON CORP122 citations99
US6107115AAug 22, 2000
Method of manufacturing spatial light modulator and electronic device employing it
SEIKO EPSON CORP123 citations99
US5999306ADec 7, 1999
Method of manufacturing spatial light modulator and electronic device employing it
SEIKO EPSON CORP227 citations99
US5259737ANov 9, 1993
Micropump with valve structure
SEIKO EPSON CORP315 citations98
US6563079B1May 13, 2003
Method for machining work by laser beam
SEIKO EPSON CORP72 citations96
US5912684AJun 15, 1999
Inkjet recording apparatus
SEIKO EPSON CORP63 citations96
US6850368B2Feb 1, 2005
System and method for providing a substrate having micro-lenses
SEIKO EPSON CORP19 citations93
US6618200B2Sep 9, 2003
System and method for providing a substrate having micro-lenses
SEIKO EPSON CORP30 citations93
US6603159B2Aug 5, 2003
System and methods for manufacturing and using a mask
SEIKO EPSON CORP19 citations92
US6469832B2Oct 22, 2002
Method for manufacturing microlens substrate, microlens substrate, opposing substrate for liquid crystal panel, liquid crystal panel, and projection display apparatus
SEIKO EPSON CORP29 citations92
US6424048B1Jul 23, 2002
Semiconductor chip, semiconductor device, circuit board and electronic equipment and production methods for them
SEIKO EPSON CORP18 citations92
US6271955B1Aug 7, 2001
Method of manufacturing spatial light modulator and electronic device employing it
SEIKO EPSON CORP29 citations92
US6120124ASep 19, 2000
Ink jet head having plural electrodes opposing an electrostatically deformable diaphragm
SEIKO EPSON CORP20 citations92
US6117698ASep 12, 2000
Method for producing the head of an ink-jet recording apparatus
SEIKO EPSON CORP21 citations92
US6113218ASep 5, 2000
Ink-jet recording apparatus and method for producing the head thereof
SEIKO EPSON CORP18 citations92
US5734395AMar 31, 1998
Ink jet head
SEIKO EPSON CORP25 citations92
US7709159B2May 4, 2010
Mask, mask forming method, pattern forming method, and wiring pattern forming method
SEIKO EPSON CORP14 citations84
US7268406B2Sep 11, 2007
Mask, mask chip, manufacturing method of mask, manufacturing method of mask chip, and electronic device
SEIKO EPSON CORP12 citations84
US7144752B2Dec 5, 2006
Method of manufacturing organic electroluminescent display device and organic electroluminescent display device, and display device equipped with organic electroluminescent display device
SEIKO EPSON CORP12 citations84
US7074694B2Jul 11, 2006
Deposition mask, manufacturing method thereof, display unit, manufacturing method thereof, and electronic apparatus including display unit
SEIKO EPSON CORP11 citations84
US6893575B2May 17, 2005
Mask and method of manufacturing the same, electro-luminescence device and method of manufacturing the same, and electronic instrument
SEIKO EPSON CORP13 citations84
US6875542B2Apr 5, 2005
Mask and method of manufacturing the same, electroluminescence device and method of manufacturing the same, and electronic instrument
SEIKO EPSON CORP14 citations84
US7054066B2May 30, 2006
Projection display device having micro-lenses
SEIKO EPSON CORP7 citations74
US7033665B2Apr 25, 2006
Precision mask for deposition and a method for manufacturing the same, an electroluminescence display and a method for manufacturing the same, and electronic equipment
SEIKO EPSON CORP7 citations74
US7006296B2Feb 28, 2006
System and method for providing a substrate having micro-lenses
SEIKO EPSON CORP4 citations74
US6930021B2Aug 16, 2005
Mask and method of manufacturing the same, electro-luminescence device and method of manufacturing the same, and electronic instrument
SEIKO EPSON CORP6 citations74
US6720236B2Apr 13, 2004
Mask and method of manufacturing the same, electro-luminescence device and method of manufacturing the same, and electronic instrument
SEIKO EPSON CORP7 citations74
US6677237B2Jan 13, 2004
Semiconductor chip, semiconductor device, circuit board and electronic equipment and production methods for them
SEIKO EPSON CORP12 citations74
US6407866B1Jun 18, 2002
Method for manufacturing microlens substrate, microlens substrate, opposing substrate for liquid crystal panel, liquid crystal panel, and projection display apparatus
SEIKO EPSON CORP11 citations74
US7909932B2Mar 22, 2011
Mask, mask manufacturing method, film forming method, electro-optic device manufacturing method, and electronic apparatus
SEIKO EPSON CORP5 citations63
US7794545B2Sep 14, 2010
Mask, film forming method, light-emitting device, and electronic apparatus
SEIKO EPSON CORP2 citations63
US7754274B2Jul 13, 2010
Mask and method for manufacturing the same, method for manufacturing display, method for manufacturing organic electroluminescent display, organic electroluminescent device, and electronic device
SEIKO EPSON CORP3 citations63
US7718006B2May 18, 2010
Mask holding structure, film forming method, electro-optic device manufacturing method, and electronic apparatus
SEIKO EPSON CORP4 citations63
US7387739B2Jun 17, 2008
Mask and method of manufacturing the same, electroluminescent device and method of manufacturing the same, and electronic instrument
SEIKO EPSON CORP2 citations63
US7285497B2Oct 23, 2007
Mask, method for manufacturing a mask, method for manufacturing an electro-optical device, and electronic equipment
SEIKO EPSON CORP4 citations63
US12594763B2Apr 7, 2026
Method of manufacturing liquid discharging head, method of manufacturing nozzle substrate, and liquid discharging head
SEIKO EPSON CORP0 citations62
US7976633B2Jul 12, 2011
Device and method of forming film
SEIKO EPSON CORP3 citations62
US7771789B2Aug 10, 2010
Method of forming mask and mask
SEIKO EPSON CORP2 citations62
US7652683B2Jan 26, 2010
Line head and image-forming apparatus
SEIKO EPSON CORP6 citations62
US11336875B2May 17, 2022
Wavelength conversion element, light source device, and projector
SEIKO EPSON CORP0 citations61
US7819717B2Oct 26, 2010
Emissive device, process for producing emissive device, and electronic apparatus
SEIKO EPSON CORP4 citations59
US7459029B2Dec 2, 2008
Cleaning method, cleaning apparatus and electro optical device
SEIKO EPSON CORP2 citations59
US10859899B2Dec 8, 2020
Wavelength conversion element, method for producing wavelength conversion element, light source device, and projector
SEIKO EPSON CORP0 citations51
US11703750B2Jul 18, 2023
Illuminator and projector
SEIKO EPSON CORP0 citations50
USRE42248EMar 29, 2011
Cleaning method, cleaning apparatus and electro optical device
SEIKO EPSON CORP1 citations48