P

Inventor

YOTSUYA SHINICHI

JP48 patents
⚠️ This page may combine multiple inventors who share the name “YOTSUYA SHINICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SEIKO EPSON CORP

46 patents
US6650461B2Nov 18, 2003

Method of manufacturing spatial light modulator and electronic device employing it

SEIKO EPSON CORP85 citations99
US6452712B2Sep 17, 2002

Method of manufacturing spatial light modulator and electronic device employing it

SEIKO EPSON CORP122 citations99
US6107115AAug 22, 2000

Method of manufacturing spatial light modulator and electronic device employing it

SEIKO EPSON CORP123 citations99
US5999306ADec 7, 1999

Method of manufacturing spatial light modulator and electronic device employing it

SEIKO EPSON CORP227 citations99
US5259737ANov 9, 1993

Micropump with valve structure

SEIKO EPSON CORP315 citations98
US6563079B1May 13, 2003

Method for machining work by laser beam

SEIKO EPSON CORP72 citations96
US5912684AJun 15, 1999

Inkjet recording apparatus

SEIKO EPSON CORP63 citations96
US6850368B2Feb 1, 2005

System and method for providing a substrate having micro-lenses

SEIKO EPSON CORP19 citations93
US6618200B2Sep 9, 2003

System and method for providing a substrate having micro-lenses

SEIKO EPSON CORP30 citations93
US6603159B2Aug 5, 2003

System and methods for manufacturing and using a mask

SEIKO EPSON CORP19 citations92
US6469832B2Oct 22, 2002

Method for manufacturing microlens substrate, microlens substrate, opposing substrate for liquid crystal panel, liquid crystal panel, and projection display apparatus

SEIKO EPSON CORP29 citations92
US6424048B1Jul 23, 2002

Semiconductor chip, semiconductor device, circuit board and electronic equipment and production methods for them

SEIKO EPSON CORP18 citations92
US6271955B1Aug 7, 2001

Method of manufacturing spatial light modulator and electronic device employing it

SEIKO EPSON CORP29 citations92
US6120124ASep 19, 2000

Ink jet head having plural electrodes opposing an electrostatically deformable diaphragm

SEIKO EPSON CORP20 citations92
US6117698ASep 12, 2000

Method for producing the head of an ink-jet recording apparatus

SEIKO EPSON CORP21 citations92
US6113218ASep 5, 2000

Ink-jet recording apparatus and method for producing the head thereof

SEIKO EPSON CORP18 citations92
US5734395AMar 31, 1998

Ink jet head

SEIKO EPSON CORP25 citations92
US7709159B2May 4, 2010

Mask, mask forming method, pattern forming method, and wiring pattern forming method

SEIKO EPSON CORP14 citations84
US7268406B2Sep 11, 2007

Mask, mask chip, manufacturing method of mask, manufacturing method of mask chip, and electronic device

SEIKO EPSON CORP12 citations84
US7144752B2Dec 5, 2006

Method of manufacturing organic electroluminescent display device and organic electroluminescent display device, and display device equipped with organic electroluminescent display device

SEIKO EPSON CORP12 citations84
US7074694B2Jul 11, 2006

Deposition mask, manufacturing method thereof, display unit, manufacturing method thereof, and electronic apparatus including display unit

SEIKO EPSON CORP11 citations84
US6893575B2May 17, 2005

Mask and method of manufacturing the same, electro-luminescence device and method of manufacturing the same, and electronic instrument

SEIKO EPSON CORP13 citations84
US6875542B2Apr 5, 2005

Mask and method of manufacturing the same, electroluminescence device and method of manufacturing the same, and electronic instrument

SEIKO EPSON CORP14 citations84
US7054066B2May 30, 2006

Projection display device having micro-lenses

SEIKO EPSON CORP7 citations74
US7033665B2Apr 25, 2006

Precision mask for deposition and a method for manufacturing the same, an electroluminescence display and a method for manufacturing the same, and electronic equipment

SEIKO EPSON CORP7 citations74
US7006296B2Feb 28, 2006

System and method for providing a substrate having micro-lenses

SEIKO EPSON CORP4 citations74
US6930021B2Aug 16, 2005

Mask and method of manufacturing the same, electro-luminescence device and method of manufacturing the same, and electronic instrument

SEIKO EPSON CORP6 citations74
US6720236B2Apr 13, 2004

Mask and method of manufacturing the same, electro-luminescence device and method of manufacturing the same, and electronic instrument

SEIKO EPSON CORP7 citations74
US6677237B2Jan 13, 2004

Semiconductor chip, semiconductor device, circuit board and electronic equipment and production methods for them

SEIKO EPSON CORP12 citations74
US6407866B1Jun 18, 2002

Method for manufacturing microlens substrate, microlens substrate, opposing substrate for liquid crystal panel, liquid crystal panel, and projection display apparatus

SEIKO EPSON CORP11 citations74
US7909932B2Mar 22, 2011

Mask, mask manufacturing method, film forming method, electro-optic device manufacturing method, and electronic apparatus

SEIKO EPSON CORP5 citations63
US7794545B2Sep 14, 2010

Mask, film forming method, light-emitting device, and electronic apparatus

SEIKO EPSON CORP2 citations63
US7754274B2Jul 13, 2010

Mask and method for manufacturing the same, method for manufacturing display, method for manufacturing organic electroluminescent display, organic electroluminescent device, and electronic device

SEIKO EPSON CORP3 citations63
US7718006B2May 18, 2010

Mask holding structure, film forming method, electro-optic device manufacturing method, and electronic apparatus

SEIKO EPSON CORP4 citations63
US7387739B2Jun 17, 2008

Mask and method of manufacturing the same, electroluminescent device and method of manufacturing the same, and electronic instrument

SEIKO EPSON CORP2 citations63
US7285497B2Oct 23, 2007

Mask, method for manufacturing a mask, method for manufacturing an electro-optical device, and electronic equipment

SEIKO EPSON CORP4 citations63
US12594763B2Apr 7, 2026

Method of manufacturing liquid discharging head, method of manufacturing nozzle substrate, and liquid discharging head

SEIKO EPSON CORP0 citations62
US7976633B2Jul 12, 2011

Device and method of forming film

SEIKO EPSON CORP3 citations62
US7771789B2Aug 10, 2010

Method of forming mask and mask

SEIKO EPSON CORP2 citations62
US7652683B2Jan 26, 2010

Line head and image-forming apparatus

SEIKO EPSON CORP6 citations62
US11336875B2May 17, 2022

Wavelength conversion element, light source device, and projector

SEIKO EPSON CORP0 citations61
US7819717B2Oct 26, 2010

Emissive device, process for producing emissive device, and electronic apparatus

SEIKO EPSON CORP4 citations59
US7459029B2Dec 2, 2008

Cleaning method, cleaning apparatus and electro optical device

SEIKO EPSON CORP2 citations59
US10859899B2Dec 8, 2020

Wavelength conversion element, method for producing wavelength conversion element, light source device, and projector

SEIKO EPSON CORP0 citations51
US11703750B2Jul 18, 2023

Illuminator and projector

SEIKO EPSON CORP0 citations50
USRE42248EMar 29, 2011

Cleaning method, cleaning apparatus and electro optical device

SEIKO EPSON CORP1 citations48

SHINTO SUSUMU

1 patent

YOTSUYA SHINICHI

1 patent