Inventor
PETRILLO KAREN ELIZABETH
US11 patents
Patents
11 patentsUS6221568B1Apr 24, 2001
Developers for polychloroacrylate and polychloromethacrylate based resists
IBM37 citations92
US6543617B2Apr 8, 2003
Packaged radiation sensitive coated workpiece process for making and method of storing same
IBM16 citations90
US10545409B1Jan 28, 2020
Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delay
IBM3 citations70
US5770345AJun 23, 1998
Photoresist having increased sensitivity and use thereof
IBM9 citations70
US5753412AMay 19, 1998
Photoresist having increased sensitivity and use thereof
IBM11 citations70
US7638266B2Dec 29, 2009
Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer
IBM4 citations62
US5908732AJun 1, 1999
Polymer compositions for high resolution resist applications
IBM5 citations62
US11688636B2Jun 27, 2023
Spin on scaffold film for forming topvia
IBM0 citations61
US7168224B2Jan 30, 2007
Method of making a packaged radiation sensitive resist film-coated workpiece
IBM4 citations60
US11067896B2Jul 20, 2021
Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delay
IBM0 citations59
US7807335B2Oct 5, 2010
Immersion lithography contamination gettering layer
IBM1 citations50