Inventor
NUNOMURA MASATAKA
JP11 patents
⚠️ This page may combine multiple inventors who share the name “NUNOMURA MASATAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI CHEM DUPONT MICROSYS
6 patentsUS6232032B1May 15, 2001
Photosensitive polymer composition, method for forming relief patterns, and electronic parts
HITACHI CHEM DUPONT MICROSYS31 citations91
US6329110B1Dec 11, 2001
Photosensitive polymer composition, method for forming relief patterns, and electronic parts
HITACHI CHEM DUPONT MICROSYS16 citations89
US7150947B2Dec 19, 2006
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment
HITACHI CHEM DUPONT MICROSYS12 citations82
US6514658B2Feb 4, 2003
Photosensitive polymer composition, method for forming relief patterns, and electronic parts
HITACHI CHEM DUPONT MICROSYS8 citations71
US6365306B2Apr 2, 2002
Photosensitive polymer composition, method for forming relief patterns, and electronic parts
HITACHI CHEM DUPONT MICROSYS3 citations61
US7851128B2Dec 14, 2010
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment
HITACHI CHEM DUPONT MICROSYS3 citations60
HITACHI CHEMICAL CO LTD
4 patentsUS5811218ASep 22, 1998
Photoinitiator compositions including amino acids, coumarin and titanocene and photosensitive materials using the same
HITACHI CHEMICAL CO LTD17 citations83
US5856059AJan 5, 1999
Photosensitive resin composition
HITACHI CHEMICAL CO LTD16 citations81
US6194126B1Feb 27, 2001
Pattern-forming process using photosensitive resin composition
HITACHI CHEMICAL CO LTD3 citations62
US7153631B2Dec 26, 2006
Pattern-forming process using photosensitive resin composition
HITACHI CHEMICAL CO LTD0 citations51