Inventor

LU SIQING

US26 patents

⚠️ This page may combine multiple inventors who share the name “LU SIQING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LU SIQING

APPLIED MATERIALS INC

Lid assembly for a processing system to facilitate sequential deposition techniques

Showerhead with reduced contact area

Valve control system for atomic layer deposition chamber

Cover ring for use in semiconductor processing chamber

Self-cooling gas delivery apparatus under high vacuum for high density plasma applications

Method and apparatus for dynamically measuring the thickness of an object

Gas baffle and distributor for semiconductor processing chamber

Valve control system for atomic layer deposition chamber

Gas baffle and distributor for semiconductor processing chamber

Internal balanced coil for inductively coupled high density plasma processing chamber

Gas baffle and distributor for semiconductor processing chamber

Internal balanced coil for inductively coupled high density plasma processing chamber

Two-piece dome with separate RF coils for inductively coupled plasma reactors

Apparatus and method of dynamically measuring thickness of a layer of a substrate

Thin substrate handling via edge clamping

Complex showerhead coating apparatus with electrospray for lithium ion battery

Deposition ring for thin substrate handling via edge clamping

Thermal management of inductively coupled plasma reactors

Method and apparatus for measuring a thickness of a layer of a wafer

Common substrate and shadow ring lift apparatus

Methods and apparatus for processing a substrate

SAMSUNG ELECTRONICS CO LTD

Substrate processing apparatus

Electrostatic chuck and wafer etching device including the same

Methods of manufacturing a semiconductor device

Plasma processing apparatus

Plasma processing apparatus and method of manufacturing semiconductor device using the same