Inventor
HIROCHI YUKITOMO
JP22 patents
⚠️ This page may combine multiple inventors who share the name “HIROCHI YUKITOMO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KOKUSAI ELECTRIC CORP
13 patentsUS11469083B2Oct 11, 2022
Plasma generating device, substrate processing apparatus, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP4 citations84
US11469081B2Oct 11, 2022
Plasma generating device, substrate processing apparatus, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP4 citations84
US11967490B2Apr 23, 2024
Plasma generating device, substrate processing apparatus, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP2 citations73
US11749510B2Sep 5, 2023
Plasma generating device, substrate processing apparatus, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP2 citations73
US11239098B2Feb 1, 2022
Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
KOKUSAI ELECTRIC CORP3 citations72
US11177143B2Nov 16, 2021
Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
KOKUSAI ELECTRIC CORP5 citations72
US11309195B2Apr 19, 2022
Heating element, substrate processing apparatus and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations61
US11018033B2May 25, 2021
Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
KOKUSAI ELECTRIC CORP1 citations61
US11553565B2Jan 10, 2023
Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium
KOKUSAI ELECTRIC CORP0 citations51
US11265977B2Mar 1, 2022
Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
KOKUSAI ELECTRIC CORP0 citations50
US12255069B2Mar 18, 2025
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
KOKUSAI ELECTRIC CORP0 citations49
US11264253B2Mar 1, 2022
Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
KOKUSAI ELECTRIC CORP0 citations49
US10633739B2Apr 28, 2020
Substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations41
HITACHI INT ELECTRIC INC
7 patentsUS9018689B1Apr 28, 2015
Substrate processing apparatus and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC10 citations84
US9070554B2Jun 30, 2015
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC4 citations73
US9064695B1Jun 23, 2015
Substrate processing apparatus, non-transitory computer-readable recording medium and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC5 citations73
US10131990B2Nov 20, 2018
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC3 citations72
US10475652B2Nov 12, 2019
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
HITACHI INT ELECTRIC INC1 citations62
US9587314B2Mar 7, 2017
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC1 citations52
US9502236B2Nov 22, 2016
Substrate processing apparatus, non-transitory computer-readable recording medium and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC0 citations52