Inventor

PUTNA ERNISSE S

US6 patents

⚠️ This page may combine multiple inventors who share the name “PUTNA ERNISSE S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

INTEL CORP

5 patents

US7678527B2Mar 16, 2010

Methods and compositions for providing photoresist with improved properties for contacting liquids

INTEL CORP11 citations82

US10459338B2Oct 29, 2019

Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging

INTEL CORP1 citations62

US7147985B2Dec 12, 2006

Resist compounds including acid labile groups having hydrophilic groups attached thereto

INTEL CORP5 citations60

US7241560B2Jul 10, 2007

Basic quencher/developer solutions for photoresists

INTEL CORP3 citations55

US7361455B2Apr 22, 2008

Anti-reflective coatings

INTEL CORP1 citations49

NYHUS PAUL A

1 patent

US9625815B2Apr 18, 2017

Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging

NYHUS PAUL A0 citations50