Inventor

LAUFER TIMO

DE20 patents

⚠️ This page may combine multiple inventors who share the name “LAUFER TIMO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LAUFER TIMO

ZEISS CARL SMT GMBH

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

Method for temperature control of a component

Method for determining properties of an EUV source

Method for temperature control of a component

Method for avoiding a degradation of an optical element, projection system, illumination system and projection exposure apparatus

Lithography apparatus

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

Projection exposure apparatus for semiconductor lithography

Device for detecting a temperature, installation for producing an optical element and method for producing an optical element

Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus

Projection exposure apparatus for semiconductor lithography with increased thermal robustness

ZEISS CARL SMT AG

Projection objective

Optical component, comprising a material with a predetermined homogeneity of thermal expansion

Optical component that includes a material having a thermal longitudinal expansion with a zero crossing

EHM DIRK HEINRICH

Protection module for EUV lithography apparatus, and EUV lithography apparatus

SCHOEPPACH ARMIN

Temperature-control device for an optical assembly

LAUFER TIMO

Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus