Inventor

STAALS FRANK

NL58 patents

⚠️ This page may combine multiple inventors who share the name “STAALS FRANK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

STAALS FRANK

ASML NETHERLANDS BV

Computational metrology

Method for determining a process window for a lithographic process, associated apparatuses and a computer program

Method and system to monitor a process apparatus

Method for controlling a lithographic apparatus and associated apparatuses

Methods and apparatus for monitoring a lithographic manufacturing process

Metrology target, method and apparatus, computer program and lithographic system

Lithographic apparatus

Level sensor, lithographic apparatus and device manufacturing method

Method of determining control parameters of a device manufacturing process

Method of determining control parameters of a device manufacturing process

Method for optimization of a lithographic process

Method of metrology, inspection apparatus, lithographic system and device manufacturing method

Wavefront optimization for tuning scanner based on performance matching

Level sensor apparatus, method of measuring topographical variation across a substrate, method of measuring variation of a physical parameter related to a lithographic process, and lithographic apparatus

Method for determining contribution to a fingerprint

Method and apparatus for determining a fingerprint of a performance parameter

Measurement method, inspection apparatus, patterning device, lithographic system and device manufacturing method

Method of calibrating focus measurements, measurement method and metrology apparatus, lithographic system and device manufacturing method

Computational metrology

Method for controlling a lithographic apparatus and associated apparatuses

Method and system to monitor a process apparatus

Separation of contributions to metrology data

Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method

Method for controlling a lithographic apparatus and associated apparatuses

Method of determining control parameters of a device manufacturing process

Method for optimization of a lithographic process

Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method

Lithographic apparatus, device manufacturing method, and device manufactured thereby

Method for determining contribution to a fingerprint

Method and apparatus for determining a fingerprint of a performance parameter

Wavefront optimization for tuning scanner based on performance matching

Metrology apparatus and method for determining a characteristic relating to one or more structures on a substrate

Control method for a scanning exposure apparatus

Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method

Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method

Methods and apparatus for monitoring a lithographic manufacturing process

Inspection apparatus, inspection method, lithographic apparatus and manufacturing method

Lithographic apparatus

Metrology apparatus and method for determining a characteristic of one or more structures on a substrate

Metrology robustness based on through-wavelength similarity

Method and apparatus for reticle optimization

Metrology robustness based on through-wavelength similarity

STAALS FRANK

Method of measuring a lithographic projection apparatus

Method and lithographic apparatus for measuring and acquiring height data relating to a substrate surface

Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate

Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product

Lithographic apparatus configured to reconstruct an aerial pattern and to compare the reconstructed aerial pattern with an aerial pattern detected by an image sensor

Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus

VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS

Lithographic apparatus

KUIT JAN-JAAP

Lithographic apparatus and device manufacturing method