Inventor
MURANAKA SEIJI
JP18 patents
⚠️ This page may combine multiple inventors who share the name “MURANAKA SEIJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
RENESAS ELECTRONICS CORP
9 patentsUS9508646B2Nov 29, 2016
Semicondutor device with copper plugs having different resistance values
RENESAS ELECTRONICS CORP6 citations83
US11450561B2Sep 20, 2022
Semiconductor device with copper interconnections
RENESAS ELECTRONICS CORP2 citations72
US10665502B2May 26, 2020
Semiconductor device with an interconnection layer and method of manufacturing the same
RENESAS ELECTRONICS CORP2 citations72
US12080591B2Sep 3, 2024
Semiconductor device having interconnection structure and method of manufacturing the same
RENESAS ELECTRONICS CORP0 citations62
US9508554B2Nov 29, 2016
Method of manufacturing semiconductor device
RENESAS ELECTRONICS CORP2 citations62
US9576921B2Feb 21, 2017
Semiconductor device and manufacturing method for the same
RENESAS ELECTRONICS CORP1 citations52
US9972530B2May 15, 2018
Method of manufacturing semiconductor device including copper interconnections
RENESAS ELECTRONICS CORP0 citations51
US9966455B2May 8, 2018
Method for manufacturing a semiconductor device
RENESAS ELECTRONICS CORP0 citations51
US9230909B2Jan 5, 2016
Semiconductor device and manufacturing method thereof, and mounting method of semiconductor device
RENESAS ELECTRONICS CORP0 citations40
MITSUBISHI ELECTRIC CORP
6 patentsUS6358329B1Mar 19, 2002
Resist residue removal apparatus and method
MITSUBISHI ELECTRIC CORP20 citations92
US6053059AApr 25, 2000
Analyzing system of organic substance adhering to a surface of a sample
MITSUBISHI ELECTRIC CORP21 citations92
US6586145B2Jul 1, 2003
Method of fabricating semiconductor device and semiconductor device
MITSUBISHI ELECTRIC CORP8 citations72
US6410454B1Jun 25, 2002
Method and apparatus for removing contaminants from the surface of a semiconductor wafer
MITSUBISHI ELECTRIC CORP13 citations68
US6340253B1Jan 22, 2002
Resist peeling system and control method of a resist peeling solution
MITSUBISHI ELECTRIC CORP3 citations58
US6531381B2Mar 11, 2003
Method and apparatus for cleaning semiconductor device and method of fabricating semiconductor device
MITSUBISHI ELECTRIC CORP0 citations51