Inventor
HAYASHI HISATAKA
JP35 patents
⚠️ This page may combine multiple inventors who share the name “HAYASHI HISATAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
17 patentsUS5302240AApr 12, 1994
Method of manufacturing semiconductor device
TOSHIBA KK200 citations99
US5592024AJan 7, 1997
Semiconductor device having a wiring layer with a barrier layer
TOSHIBA KK133 citations98
US6794286B2Sep 21, 2004
Process for fabricating a metal wiring and metal contact in a semicondutor device
TOSHIBA KK55 citations96
US5445710AAug 29, 1995
Method of manufacturing semiconductor device
TOSHIBA KK86 citations96
US5310454AMay 10, 1994
Dry etching method
TOSHIBA KK54 citations96
US5240554AAug 31, 1993
Method of manufacturing semiconductor device
TOSHIBA KK59 citations96
US10388544B2Aug 20, 2019
Substrate processing apparatus and substrate processing method
TOSHIBA KK45 citations93
US6576562B2Jun 10, 2003
Manufacturing method of semiconductor device using mask pattern having high etching resistance
TOSHIBA KK36 citations92
US6090699AJul 18, 2000
Method of making a semiconductor device
TOSHIBA KK35 citations92
US5503901AApr 2, 1996
Surface treatment method and surface treatment apparatus
TOSHIBA KK45 citations92
US6780278B2Aug 24, 2004
Plasma processing apparatus with reduced parasitic capacity and loss in RF power
TOSHIBA KK16 citations84
US6274512B1Aug 14, 2001
Method for manufacturing a semiconductor device
TOSHIBA KK11 citations74
US6420271B2Jul 16, 2002
Method of forming a pattern
TOSHIBA KK8 citations73
US7727899B2Jun 1, 2010
Manufacturing method of semiconductor device and semiconductor storage device including fine contact holes
TOSHIBA KK2 citations63
US7658859B2Feb 9, 2010
Method of processing organic film using plasma etching and method of manufacturing semiconductor device
TOSHIBA KK2 citations63
US9111875B2Aug 18, 2015
Pattern formation method
TOSHIBA KK3 citations62
US7285498B2Oct 23, 2007
Etching method
TOSHIBA KK2 citations60
TOKYO ELECTRON LTD
4 patentsUS5595627AJan 21, 1997
Plasma etching method
TOKYO ELECTRON LTD171 citations98
US7749914B2Jul 6, 2010
Plasma etching method
TOKYO ELECTRON LTD39 citations93
US7625494B2Dec 1, 2009
Plasma etching method and plasma etching unit
TOKYO ELECTRON LTD35 citations92
US7419613B2Sep 2, 2008
Method and device for plasma-etching organic material film
TOKYO ELECTRON LTD5 citations63
UI AKIO
4 patentsUS8821684B2Sep 2, 2014
Substrate plasma processing apparatus and plasma processing method
UI AKIO52 citations92
US8821744B2Sep 2, 2014
Substrate processing method and substrate processing apparatus
UI AKIO4 citations72
US9583360B2Feb 28, 2017
Substrate processing apparatus and substrate processing method
UI AKIO1 citations51
US8252193B2Aug 28, 2012
Plasma processing apparatus of substrate and plasma processing method thereof
UI AKIO1 citations51