Inventor
MATSUNO SHIGERU
JP30 patents
⚠️ This page may combine multiple inventors who share the name “MATSUNO SHIGERU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI ELECTRIC CORP
23 patentsUS6470144B1Oct 22, 2002
Vaporizer for chemical vapor deposition apparatus, chemical vapor deposition apparatus, and semiconductor device manufactured thereby
MITSUBISHI ELECTRIC CORP66 citations96
US6312526B1Nov 6, 2001
Chemical vapor deposition apparatus and a method of manufacturing a semiconductor device
MITSUBISHI ELECTRIC CORP45 citations96
US6638880B2Oct 28, 2003
Chemical vapor deposition apparatus and a method of manufacturing a semiconductor device
MITSUBISHI ELECTRIC CORP23 citations92
US6273957B1Aug 14, 2001
Vaporizing device for CVD source materials and CVD apparatus employing the same
MITSUBISHI ELECTRIC CORP28 citations92
US6235649B1May 22, 2001
Method of forming high dielectric constant thin film and method of manufacturing semiconductor device
MITSUBISHI ELECTRIC CORP16 citations92
US5555154ASep 10, 1996
CVD Raw Material for oxide-system dielectric thin film and capacitor produced by CVD method using the CVD raw material
MITSUBISHI ELECTRIC CORP35 citations92
US7163197B2Jan 16, 2007
Liquid substance supply device for vaporizing system, vaporizer, and vaporization performance appraisal method
MITSUBISHI ELECTRIC CORP21 citations91
US5372850ADec 13, 1994
Method of manufacturing an oxide-system dielectric thin film using CVD method
MITSUBISHI ELECTRIC CORP39 citations89
US5034372AJul 23, 1991
Plasma based method for production of superconductive oxide layers
MITSUBISHI ELECTRIC CORP53 citations88
US6512297B2Jan 28, 2003
CVD source material for forming an electrode, and electrode and wiring film for capacitor formed therefrom
MITSUBISHI ELECTRIC CORP13 citations84
US6231658B1May 15, 2001
Chemical vapor deposition source for depositing lead zirconate titanate film
MITSUBISHI ELECTRIC CORP4 citations74
US6882760B2Apr 19, 2005
Polarization dispersion compensating apparatus
MITSUBISHI ELECTRIC CORP10 citations73
US6643430B2Nov 4, 2003
Temperature control system for a grating
MITSUBISHI ELECTRIC CORP10 citations73
US6212059B1Apr 3, 2001
Capacitor including barium strontium titanate film
MITSUBISHI ELECTRIC CORP10 citations73
US6103002AAug 15, 2000
CVD method for forming oxide-system dielectric thin film
MITSUBISHI ELECTRIC CORP4 citations73
US6063443AMay 16, 2000
CVD method for forming oxide-system dielectric thin film
MITSUBISHI ELECTRIC CORP10 citations73
US8039396B2Oct 18, 2011
Method for manufacturing photovoltaic device
MITSUBISHI ELECTRIC CORP2 citations62
US6690860B2Feb 10, 2004
Method of manufacturing grating
MITSUBISHI ELECTRIC CORP4 citations62
US6236559B1May 22, 2001
Capacitor
MITSUBISHI ELECTRIC CORP2 citations62
US6810179B2Oct 26, 2004
Variable dispersion compensator
MITSUBISHI ELECTRIC CORP4 citations61
US7078330B2Jul 18, 2006
Metal electrode and bonding method using the metal electrode
MITSUBISHI ELECTRIC CORP6 citations60
US6448191B2Sep 10, 2002
Method of forming high dielectric constant thin film and method of manufacturing semiconductor device
MITSUBISHI ELECTRIC CORP0 citations52
US6807322B2Oct 19, 2004
PMD compensating apparatus for controlling polarization controller based on detection of magnitude of waveform distortion
MITSUBISHI ELECTRIC CORP0 citations40
SHIMADZU CORP
3 patentsUS7422198B2Sep 9, 2008
Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal method
SHIMADZU CORP18 citations91
US7731162B2Jun 8, 2010
Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal method
SHIMADZU CORP4 citations72
US7637482B2Dec 29, 2009
Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal method
SHIMADZU CORP3 citations61