Inventor
YAHAGI MASATAKA
JP33 patents
⚠️ This page may combine multiple inventors who share the name “YAHAGI MASATAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIPPON MINING CO
13 patentsUS7699965B2Apr 20, 2010
Zinc oxide-based transparent conductor and sputtering target for forming the transparent conductor
NIPPON MINING CO20 citations92
US7635440B2Dec 22, 2009
Sputtering target, thin film for optical information recording medium and process for producing the same
NIPPON MINING CO22 citations92
US7279211B2Oct 9, 2007
Sputtering target containing zinc sulfide as major component, optical recording medium on which phase change optical disk protective film containing zinc sulfide as major component is formed by using the target, and method for manufacturing the sputtering target
NIPPON MINING CO19 citations92
US7156964B2Jan 2, 2007
Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the target
NIPPON MINING CO20 citations92
US7217310B2May 15, 2007
Metal powder for powder metallurgy and iron-based sintered compact
NIPPON MINING CO24 citations91
US7718095B2May 18, 2010
Sputtering target, thin film for optical information recording medium and process for producing the same
NIPPON MINING CO10 citations84
US7484546B2Feb 3, 2009
Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the target
NIPPON MINING CO9 citations84
US7347969B2Mar 25, 2008
Iron-based sintered compact and method for production thereof
NIPPON MINING CO13 citations84
US7344660B2Mar 18, 2008
Sputtering target and process for producing the same
NIPPON MINING CO10 citations84
US7789948B2Sep 7, 2010
Hydrogen separation membrane, sputtering target for forming said hydrogen separation membrane, and manufacturing method thereof
NIPPON MINING CO9 citations83
US7727639B2Jun 1, 2010
Iron-based sintered compact and method for production thereof
NIPPON MINING CO3 citations63
US7691172B2Apr 6, 2010
Metallic powder for powder metallurgy whose main component is iron and iron-based sintered body
NIPPON MINING CO3 citations61
US7666245B2Feb 23, 2010
Metallic powder for powder metallurgy whose main component is iron and iron-based sintered body
NIPPON MINING CO3 citations61
IKISAWA MASAKATSU
6 patentsUS8148245B2Apr 3, 2012
Method for producing a-IGZO oxide thin film
IKISAWA MASAKATSU60 citations96
US8728358B2May 20, 2014
Sintered compact, amorphous film and crystalline film of composite oxide, and process for producing the films
IKISAWA MASAKATSU7 citations81
US8277694B2Oct 2, 2012
Sintered compact of composite oxide, amorphous film of composite oxide, process for producing said film, crystalline film of composite oxide and process for producing said film
IKISAWA MASAKATSU6 citations81
US8252206B2Aug 28, 2012
Amorphous film of composite oxide, crystalline film of composite oxide, method of producing said films and sintered compact of composite oxide
IKISAWA MASAKATSU4 citations60
US9028726B2May 12, 2015
Oxide sintered compact for producing transparent conductive film
IKISAWA MASAKATSU0 citations51
US9663405B2May 30, 2017
Oxide sintered compact, its production method, and raw material powder for producing oxide sintered compact
IKISAWA MASAKATSU0 citations49
JX NIPPON MINING & METALS CORP
4 patentsUS7897068B2Mar 1, 2011
Sputtering target, thin film for optical information recording medium and process for producing the same
JX NIPPON MINING & METALS CORP4 citations73
US11651790B2May 16, 2023
Thin film comprising titanium oxide, and method of producing thin film comprising titanium oxide
JX NIPPON MINING & METALS CORP0 citations62
US8007693B2Aug 30, 2011
Zinc oxide based transparent electric conductor, sputtering target for forming of the conductor and process for producing the target
JX NIPPON MINING & METALS CORP4 citations62
US7892457B2Feb 22, 2011
Sputtering target, thin film for optical information recording medium and process for producing the same
JX NIPPON MINING & METALS CORP1 citations62
TAKAMI HIDEO
3 patentsUS8758497B2Jun 24, 2014
Sputtering target of sintered Ti—Nb based oxide, thin film of Ti—Nb based oxide, and method of producing the thin film
TAKAMI HIDEO4 citations72
US8501052B2Aug 6, 2013
Thin film comprising titanium oxide as main component and sintered compact sputtering target comprising titanium oxide as main component
TAKAMI HIDEO2 citations61
US8877021B2Nov 4, 2014
Chromic oxide powder for sputtering target, and sputtering target manufactured from such chromic oxide powder
TAKAMI HIDEO0 citations51