Inventor
LIN BO-JIUN
TW21 patents
⚠️ This page may combine multiple inventors who share the name “LIN BO-JIUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
18 patentsUS10008382B2Jun 26, 2018
Semiconductor device having a porous low-k structure
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US9941157B2Apr 10, 2018
Porogen bonded gap filling material in semiconductor manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations84
US9627256B2Apr 18, 2017
Integrated circuit interconnects and methods of making same
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations84
US9709905B2Jul 18, 2017
System and method for dark field inspection
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US12300486B2May 13, 2025
System and method of forming a porous low-k structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12249574B2Mar 11, 2025
Interconnect structure of semiconductor device and method of forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12142521B2Nov 12, 2024
Interconnect structure and semiconductor device having the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11984316B2May 14, 2024
Porogen bonded gap filling material in semiconductor manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11957070B2Apr 9, 2024
Semiconductor device, memory cell and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11658120B2May 23, 2023
Porogen bonded gap filling material in semiconductor manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11637010B2Apr 25, 2023
System and method of forming a porous low-k structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11456211B2Sep 27, 2022
Method of forming interconnect structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11450563B2Sep 20, 2022
Interconnect structure and method
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US12327792B2Jun 10, 2025
Semiconductor structure and manufacturing methods thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12094771B2Sep 17, 2024
Interconnect structure and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10867922B2Dec 15, 2020
Porogen bonded gap filling material in semiconductor manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10679846B2Jun 9, 2020
System and method of forming a porous low-K structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9905457B2Feb 27, 2018
High boiling temperature solvent additives for semiconductor processing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations42