Inventor
LEVASIER LEON MARTIN
NL26 patents
⚠️ This page may combine multiple inventors who share the name “LEVASIER LEON MARTIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
20 patentsUS7408655B2Aug 5, 2008
Lithographic apparatus and method for calibrating the same
ASML NETHERLANDS BV72 citations98
US7292312B2Nov 6, 2007
Lithographic apparatus and method for calibrating the same
ASML NETHERLANDS BV139 citations98
US7256871B2Aug 14, 2007
Lithographic apparatus and method for calibrating the same
ASML NETHERLANDS BV146 citations98
US6710849B2Mar 23, 2004
Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method
ASML NETHERLANDS BV74 citations98
US7880901B2Feb 1, 2011
Lithographic apparatus and method for calibrating the same
ASML NETHERLANDS BV63 citations97
US7859686B2Dec 28, 2010
Lithographic apparatus and method for calibrating the same
ASML NETHERLANDS BV61 citations97
US7528965B2May 5, 2009
Lithographic apparatus and method for calibrating the same
ASML NETHERLANDS BV69 citations97
US7002667B2Feb 21, 2006
Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV15 citations82
US7239368B2Jul 3, 2007
Using unflatness information of the substrate table or mask table for decreasing overlay
ASML NETHERLANDS BV10 citations81
US11422476B2Aug 23, 2022
Methods and apparatus for monitoring a lithographic manufacturing process
ASML NETHERLANDS BV2 citations73
US6995831B2Feb 7, 2006
Lithographic apparatus with alignment subsystem, device manufacturing method, using alignment, and alignment structure
ASML NETHERLANDS BV8 citations72
US9983489B2May 29, 2018
Method for compensating for an exposure error, a device manufacturing method, a substrate table, a lithographic apparatus, a control system, a method for measuring reflectivity and a method for measuring a dose of EUV radiation
ASML NETHERLANDS BV5 citations71
US7542127B2Jun 2, 2009
Lithographic apparatus and method for manufacturing a device
ASML NETHERLANDS BV7 citations71
US6955074B2Oct 18, 2005
Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV7 citations71
US7271917B2Sep 18, 2007
Lithographic apparatus, position quantity detection system and method
ASML NETHERLANDS BV9 citations65
US7170580B2Jan 30, 2007
Lithographic apparatus, projection system, method of projecting and device manufacturing method
ASML NETHERLANDS BV5 citations63
US8368902B2Feb 5, 2013
Lithographic apparatus and method for calibrating the same
ASML NETHERLANDS BV1 citations62
US10935895B2Mar 2, 2021
Lithographic apparatus
ASML NETHERLANDS BV0 citations61
US10866527B2Dec 15, 2020
Methods and apparatus for monitoring a lithographic manufacturing process
ASML NETHERLANDS BV0 citations52
US8351022B2Jan 8, 2013
Radiation beam modification apparatus and method
ASML NETHERLANDS BV1 citations52