Inventor
NAMAI HAYATO
JP23 patents
⚠️ This page may combine multiple inventors who share the name “NAMAI HAYATO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
19 patentsUS9477149B2Oct 25, 2016
Photoresist composition, compound, and production method thereof
JSR CORP6 citations83
US9529259B2Dec 27, 2016
Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound
JSR CORP4 citations72
US9465291B2Oct 11, 2016
Radiation-sensitive resin composition, polymer, compound, and method for producing compound
JSR CORP4 citations72
US10824073B2Nov 3, 2020
Radiation-sensitive resin composition and resist pattern-forming method
JSR CORP3 citations71
US9594303B2Mar 14, 2017
Resist pattern-forming method and photoresist composition
JSR CORP4 citations71
US9412593B2Aug 9, 2016
Composition for film formation, resist underlayer film, and forming method of resist underlayer film, and pattern-forming method
JSR CORP2 citations61
US10331031B2Jun 25, 2019
Resin composition, resist pattern-forming method and polymer
JSR CORP0 citations51
US10088750B2Oct 2, 2018
Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method
JSR CORP0 citations51
US9720322B2Aug 1, 2017
Photoresist composition, compound, and production method thereof
JSR CORP0 citations51
US9588423B2Mar 7, 2017
Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method
JSR CORP1 citations51
US9323146B2Apr 26, 2016
Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable base
JSR CORP1 citations51
US11320739B2May 3, 2022
Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate
JSR CORP0 citations50
US11966161B2Apr 23, 2024
Radiation-sensitive resin composition, method of forming resist pattern, and compound
JSR CORP0 citations48
US9874816B2Jan 23, 2018
Radiation-sensitive resin composition and resist pattern-forming method
JSR CORP0 citations41
US9557641B2Jan 31, 2017
Photoresist composition, resist pattern-forming method, acid diffusion control agent, and compound
JSR CORP0 citations41
US9760004B2Sep 12, 2017
Radiation-sensitive resin composition and resist pattern-forming method
JSR CORP0 citations39
US9126231B2Sep 8, 2015
Insulation pattern-forming method and insulation pattern-forming material
JSR CORP0 citations39
US9703195B2Jul 11, 2017
Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound
JSR CORP0 citations36
US8883023B2Nov 11, 2014
Method for forming pattern
JSR CORP0 citations33