Inventor

HSU LI TE

TW63 patents

⚠️ This page may combine multiple inventors who share the name “HSU LI TE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HSU LI TE

TAIWAN SEMICONDUCTOR MFG CO LTD

Contact structure for semiconductor device

Metal gates of transistors having reduced resistivity

Contact structure for semiconductor device

Metal gates of transistors having reduced resistivity

Semiconductor device structure and method for forming the same

Metal gates of transistors having reduced resistivity

Magnetic tunnel junction device and method of forming same

Metal gates of transistors having reduced resistivity

Method of forming a FinFET with work function tuning layers having stair-step increment sidewalls

Semiconductor device and manufacturing method thereof

Contact structure for semiconductor device

Self-aligned spacers and method forming same

Gate structure and method of forming the same

Doping through diffusion and epitaxy profile shaping

Semiconductor device and method of manufacture

Doping through diffusion and epitaxy profile shaping

Interconnect structure of semiconductor device

Method for forming semiconductor device structure

Method of forming interconnect structures

Contact structure for semiconductor device

Method for forming features of semiconductor structure having reduced end-to-end spacing

Semiconductor devices FinFET devices with optimized strained-sourece-drain recess profiles and methods of forming the same

Backside illuminated image sensor device having an oxide film and method of forming an oxide film of a backside illuminated image sensor device

Fin-type field effect transistor structure and manufacturing method thereof

Contact structure for semiconductor device

Metal gates of transistors having reduced resistivity

Semiconductor device and method of manufacture

Gate structure and method of forming the same

Interconnect structure of semiconductor device

Semiconductor device and method of manufacture

Metal gates of transistors having reduced resistivity

Self-aligned spacers and method forming same

Semiconductor device and manufacturing method thereof

Method for forming features of semiconductor structure having reduced end-to-end spacing

Method of manufacture of a FinFET device

Critical dimension uniformity

Methods of forming conductive features using a vacuum environment

Critical dimension uniformity

Method of manufacture of a FinFET device

Semiconductor device and manufacturing method thereof

Magnetic tunnel junction device and method of forming same

Magnetic tunnel junction device and method of forming same

Semiconductor devices, FinFET devices with optimized strained source-drain recess profiles and methods of forming the same

Method for forming semiconductor device with gate stack

Contact plugs and methods of forming same

Method for forming semiconductor device structure

TAIWAN SEMICONDUCTOR MFG

Controlling system for gate formation of semiconductor devices

Plasma treatment method to reduce silicon erosion over HDI silicon regions

Method and system for improving wet chemical bath process stability and productivity in semiconductor manufacturing

Critical dimension control in a semiconductor fabrication process