Inventor

HAWRYLCHAK LARA

US61 patents

⚠️ This page may combine multiple inventors who share the name “HAWRYLCHAK LARA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HAWRYLCHAK LARA

APPLIED MATERIALS INC

Showerhead for a semiconductor processing chamber

In-situ removable electrostatic chuck

Showerhead design

Method and apparatus for precleaning a substrate surface prior to epitaxial growth

High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process

In-situ removable electrostatic chuck

Adjustable process spacing, centering, and improved gas conductance

Asymmetric injection for better wafer uniformity

Method and apparatus for selective nitridation process

Asymmetric injection for better wafer uniformity

Thermal cooling member with low temperature control

Methods and apparatus for selective oxidation of a substrate

Fast response pedestal assembly for selective preclean

Plasma-enhanced anneal chamber for wafer outgassing

Integrated epitaxy and preclean system

Epitaxy system integrated with high selectivity oxide removal and high temperature contaminant removal

Plasma-enhanced anneal chamber for wafer outgassing

Showerhead design

Plasma treating a process chamber

Adjustable process spacing, centering, and improved gas conductance

Adjustable process spacing, centering, and improved gas conductance

Methods for calibrating an optical emission spectrometer

Dual pressure oxidation method for forming an oxide layer in a feature

Methods for calibrating an optical emission spectrometer

Gas injector with baffle

Gas injector with baffle

Thermal processing chamber with low temperature control

Methods and apparatus for processing substrates using an ion shield

Integrated epitaxy and preclean system

Argon addition to remote plasma oxidation

Thin film treatment process

Method and apparatus for selective nitridation process

Argon addition to remote plasma oxidation

Plasma treating a process chamber

Fast response pedestal assembly for selective preclean

Processing system and method of delivering a reactant gas

Gas injection apparatus with heating channels

Semiconductor processing chamber

Methods of selective oxidation on rapid thermal processing (RTP) chamber with active steam generation

Selective oxidation on rapid thermal processing (RTP) chamber with active steam generation

Non-disappearing anode for use with dielectric deposition

Apparatus and methods for backside passivation

Substrate support ring for more uniform layer thickness

HAWRYLCHAK LARA

Adjustable process spacing, centering, and improved gas conductance

Encapsulated sputtering target

Encapsulated sputtering target

YOUNG DONNY

Process kit for RF physical vapor deposition

Process kit for RF physical vapor deposition

HOFFMAN DANIEL J

Physical vapor deposition reactor with circularly symmetric RF feed and DC feed to the sputter target

ROGERS MATTHEW S

Method and apparatus for selective nitridation process