Inventor

KREUZER JUSTIN L

US26 patents

⚠️ This page may combine multiple inventors who share the name “KREUZER JUSTIN L”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KREUZER JUSTIN L

ASML HOLDING NV

Optical reduction method with elimination of reticle diffraction induced bias

Optical reduction system with control of illumination polarization

Optical reduction system with control of illumination polarization

Optical reduction system with elimination of reticle diffraction induced bias

Self referencing mark independent alignment sensor

Wafer handling system for use in lithography patterning

Method and system for improving focus accuracy in a lithography system

Wafer handling method for use in lithography patterning

Symmetrical illumination forming system and method

System and method to block unwanted light reflecting from a pattern generating portion from reaching an object

Method and system for improving focus accuracy in a lithography system

Method and systems for improving focus accuracy in a lithography system

Interferometric lithographic projection apparatus

Wafer handling method for use in lithography patterning

SVG LITHOGRAPHY SYSTEMS INC

In situ projection optic metrology method and apparatus

Mask and wafer diffraction grating alignment system wherein the diffracted light beams return substantially along an incident angle

ZYGO CORP

Interferometers for measuring changes in optical beam direction

Optical beam shearing apparatus

PERKIN ELMER CORP

Method and apparatus for aligning an opaque mask with an integrated circuit wafer

Synthetic imaging technique

ASML NETHERLANDS BV

Using an interferometer as a high speed variable attenuator

Using an interferometer as a high speed variable attenuator

(unassigned)

Self referencing mark independent alignment sensor

SILICON VALLEY GROUP

Optical reduction system with elimination of reticle diffraction induced bias

ASML HOLDINGS N V

Method and system to interferometrically detect an alignment mark

SEWELL HARRY

Lithographic apparatus and device manufacturing method