Inventor
TAO ZHENG
BE23 patents
⚠️ This page may combine multiple inventors who share the name “TAO ZHENG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IMEC VZW
19 patentsUS11107812B2Aug 31, 2021
Method of fabricating stacked semiconductor device
IMEC VZW2 citations71
US9899220B2Feb 20, 2018
Method for patterning a substrate involving directed self-assembly
IMEC VZW2 citations71
US10090393B2Oct 2, 2018
Method for forming a field effect transistor device having an electrical contact
IMEC VZW2 citations70
US11776841B2Oct 3, 2023
Buried power rail contact formation
IMEC VZW0 citations61
US12512417B2Dec 30, 2025
Method and structure for determining an overlay error
IMEC VZW0 citations60
US11862452B2Jan 2, 2024
Contact isolation in semiconductor devices
IMEC VZW0 citations60
US11824122B2Nov 21, 2023
Method for filling a space in a semiconductor
IMEC VZW0 citations60
US12451429B2Oct 21, 2025
Interconnection structure for a semiconductor device
IMEC VZW0 citations55
US12237207B2Feb 25, 2025
Method for forming a buried metal line in a semiconductor substrate
IMEC VZW0 citations50
US11430697B2Aug 30, 2022
Method of forming a mask layer
IMEC VZW0 citations50
US10153341B2Dec 11, 2018
Method of forming internal spacer for nanowires
IMEC VZW1 citations50
US12538779B2Jan 27, 2026
Method for producing a buried interconnect rail of an integrated circuit chip
IMEC VZW0 citations49
US10493378B2Dec 3, 2019
Method of forming micro-pipes on a substrate and a structure formed thereof
IMEC VZW0 citations47
US12381116B2Aug 5, 2025
Method of manufacturing an interconnection structure for a semiconductor device having a spacer separating first and second conductive lines
IMEC VZW0 citations44
US10128371B2Nov 13, 2018
Self-aligned nanostructures for semiconductor devices
IMEC VZW0 citations41
US10825682B2Nov 3, 2020
Method for producing a pillar structure in a semiconductor layer
IMEC VZW0 citations40
US9520291B2Dec 13, 2016
Method of providing an implanted region in a semiconductor structure
IMEC VZW0 citations40
US10790382B2Sep 29, 2020
Method for forming horizontal nanowires and devices manufactured thereof
IMEC VZW0 citations36
US9548208B2Jan 17, 2017
Method for patterning an underlying layer
IMEC VZW0 citations34