Inventor
PARK SE JUNG
KR19 patents
⚠️ This page may combine multiple inventors who share the name “PARK SE JUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ERAE AMS CO LTD
6 patentsUS10053140B2Aug 21, 2018
Tilting structure of electrically powered steering apparatus and electrically powered steering apparatus comprising same
ERAE AMS CO LTD3 citations65
US12305251B2May 20, 2025
Heat treatment method for tubular shaft for drive shaft having ball spline structure and tubular shaft manufactured thereby
ERAE AMS CO LTD0 citations58
USD953377SMay 31, 2022
Seal for drive shaft of a vehicle
ERAE AMS CO LTD1 citations58
US10059365B2Aug 28, 2018
Tilting structure of electric power steering apparatus and electric power steering apparatus including same
ERAE AMS CO LTD0 citations50
US11767877B2Sep 26, 2023
Plunging assembly for driveshaft
ERAE AMS CO LTD0 citations49
US12031594B2Jul 9, 2024
Plunging shaft and drive shaft assembly including same
ERAE AMS CO LTD0 citations47
LG CHEMICAL LTD
5 patentsUS11299624B2Apr 12, 2022
Thermoplastic polyurethane film and preparation method thereof
LG CHEMICAL LTD0 citations60
US12509575B2Dec 30, 2025
Polyethylene composition and biaxially stretched film comprising same
LG CHEMICAL LTD0 citations59
US10545265B2Jan 28, 2020
Functional antireflection film
LG CHEMICAL LTD0 citations51
US11577497B2Feb 14, 2023
Method for preparing thermoplastic polyurethane film and thermoplastic polyurethane film prepared thereby
LG CHEMICAL LTD0 citations49
US11161929B2Nov 2, 2021
Thermoplastic polyurethane film and preparation method thereof
LG CHEMICAL LTD0 citations49
SAMSUNG ELECTRONICS CO LTD
4 patentsUS9627542B2Apr 18, 2017
Semiconductor device and method for fabricating the same
SAMSUNG ELECTRONICS CO LTD6 citations83
US10062786B2Aug 28, 2018
Semiconductor device and method for fabricating the same
SAMSUNG ELECTRONICS CO LTD1 citations52
US10428242B2Oct 1, 2019
Slurry composition for chemical mechanical polishing
SAMSUNG ELECTRONICS CO LTD0 citations47
US10153214B2Dec 11, 2018
Patterning method and a method of fabricating a semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD0 citations41