Inventor

DEN BOEF ARIE JEFFREY

NL238 patents

⚠️ This page may combine multiple inventors who share the name “DEN BOEF ARIE JEFFREY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

DEN BOEF ARIE JEFFREY

ASML NETHERLANDS BV

Method and apparatus for angular-resolved spectroscopic lithography characterization

Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement

Characterization of transmission losses in an optical system

Device inspection method and apparatus using an asymmetric marker

Lithographic apparatus, device manufacturing method, and device manufactured thereby

Method and apparatus for measuring asymmetry of a microstructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing method

Lithographic apparatus

Diffraction based overlay metrology tool and method of diffraction based overlay metrology

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Angularly resolved scatterometer, inspection method, lithographic apparatus, lithographic processing cell device manufacturing method and alignment sensor

Methods and scatterometers, lithographic systems, and lithographic processing cells

Method and apparatus for angular-resolved spectroscopic lithography characterization

Method and apparatus for angular-resolved spectroscopic lithography characterization

Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate

Computational wafer inspection

Alignment system and method

Metrology method, computer product and system

Metrology apparatus and a method of determining a characteristic of interest

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Metrology system and method for determining a characteristic of one or more structures on a substrate

Method of designing metrology targets, substrates having metrology targets, method of measuring overlay, and device manufacturing method

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Metrology method, computer product and system

Metrology recipe selection

Diffraction based overlay metrology tool and method of diffraction based overlay metrology

Metrology method, target and substrate

Inspection apparatus and method

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Metrology method, target and substrate

Determination of stack difference and correction using stack difference

Method of designing metrology targets, substrates having metrology targets, method of measuring overlay, and device manufacturing method

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Diffraction based overlay metrology tool and method of diffraction based overlay metrology

Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method

Inspection apparatus and method

DEN BOEF ARIE JEFFREY

Diffraction based overlay metrology tool and method

Overlay measurement apparatus, lithographic apparatus and device manufacturing method using such overlay measurement apparatus

Metrology method and apparatus, lithographic apparatus, and device manufacturing method

Measuring method, measuring apparatus, lithographic apparatus and device manufacturing method

Method of optimizing a model, a method of measuring a property, a device manufacturing method, a spectrometer and a lithographic apparatus

Method and apparatus for determining an overlay error

Optical apparatus, method of scanning, lithographic apparatus and device manufacturing method

Inspection method for lithography

SMILDE HENDRIK JAN HIDDE

Metrology method and apparatus, lithographic apparatus, device manufacturing method and substrate

CRAMER HUGO AUGUSTINUS JOSEPH

Methods and scatterometers, lithographic systems, and lithographic processing cells

LOF JOERI

Lithographic apparatus and device manufacturing method

VAN DER SCHAAR MAURITS

Method of measurement, an inspection apparatus and a lithographic apparatus

PELLEMANS HENRICUS PETRUS MARIA

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

WUISTER SANDER FREDERIK

Imprint lithography