Inventor

KOOLEN ARMAND EUGENE ALBERT

NL32 patents

⚠️ This page may combine multiple inventors who share the name “KOOLEN ARMAND EUGENE ALBERT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOOLEN ARMAND EUGENE ALBERT

ASML NETHERLANDS BV

Lithographic apparatus and device manufacturing method

Metrology system and method for determining a characteristic of one or more structures on a substrate

Method of determining an illumination profile and device manufacturing method

Method for determining parameters for lithographic projection, a computer system and computer program therefor, a method of manufacturing a device and a device manufactured thereby

Metrology method and apparatus, and device manufacturing method

Metrology system and method for determining a characteristic of one or more structures on a substrate

Metrology apparatus, lithographic system, and method of measuring a structure

Metrology method and apparatus, substrate, lithographic system and device manufacturing method

Metrology method and apparatus, substrate, lithographic system and device manufacturing method

Radiation receiving system

Metrology apparatus, lithographic system, and method of measuring a structure

Metrology method and apparatus, computer program and lithographic system

Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method

Method and apparatus for measuring a parameter of interest using image plane detection techniques

Method and device for focusing in an inspection system

Method for monitoring a characteristic of illumination from a metrology apparatus

Metrology system and method for determining a characteristic of one or more structures on a substrate

Metrology system and method for determining a characteristic of one or more structures on a substrate

Method of measuring a parameter of a lithographic process, metrology apparatus

Metrology apparatus, method of measuring a structure, device manufacturing method

Metrology method, apparatus and computer program

Method of measuring a parameter of a patterning process, metrology apparatus, target

Focus control arrangement and method

Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method

Beam homogenizer, illumination system and metrology system

Metrology method and apparatus, computer program and lithographic system

Metrology method and apparatus, computer program and lithographic system

ASML HOLDING NV

Variable corrector of a wave front

Method for filtering an image and associated metrology apparatus

SMILDE HENDRIK JAN HIDDE

Metrology method and apparatus, lithographic apparatus, device manufacturing method and substrate

SHMAREV YEVGENIY KONSTANTINOVICH

Metrology method and device

DE WIT JOHANNES MATHEUS MARIE

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method