Inventor
COENE WILLEM MARIE JULIA MARCEL
NL30 patents
⚠️ This page may combine multiple inventors who share the name “COENE WILLEM MARIE JULIA MARCEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
19 patentsUS9946167B2Apr 17, 2018
Metrology method and inspection apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV18 citations94
US10816909B2Oct 27, 2020
Metrology system and method for determining a characteristic of one or more structures on a substrate
ASML NETHERLANDS BV5 citations84
US10732513B2Aug 4, 2020
Method and apparatus for image analysis
ASML NETHERLANDS BV4 citations84
US10437157B2Oct 8, 2019
Method and apparatus for image analysis
ASML NETHERLANDS BV5 citations84
US8363220B2Jan 29, 2013
Method of determining overlay error and a device manufacturing method
ASML NETHERLANDS BV9 citations84
US11415900B2Aug 16, 2022
Metrology system and method for determining a characteristic of one or more structures on a substrate
ASML NETHERLANDS BV1 citations73
US11143970B2Oct 12, 2021
Method and apparatus for image analysis
ASML NETHERLANDS BV2 citations73
US10890540B2Jan 12, 2021
Object identification and comparison
ASML NETHERLANDS BV4 citations73
US10607334B2Mar 31, 2020
Method and apparatus for image analysis
ASML NETHERLANDS BV2 citations73
US10379448B2Aug 13, 2019
Methods and apparatus for predicting performance of a measurement method, measurement method and apparatus
ASML NETHERLANDS BV3 citations73
US9915879B2Mar 13, 2018
Substrate and patterning device for use in metrology, metrology method and device manufacturing method
ASML NETHERLANDS BV4 citations72
US10585363B2Mar 10, 2020
Alignment system
ASML NETHERLANDS BV4 citations70
US12366811B2Jul 22, 2025
Metrology system and method for determining a characteristic of one or more structures on a substrate
ASML NETHERLANDS BV0 citations62
US12007700B2Jun 11, 2024
Metrology system and method for determining a characteristic of one or more structures on a substrate
ASML NETHERLANDS BV0 citations62
US11720029B2Aug 8, 2023
Method and apparatus for image analysis
ASML NETHERLANDS BV0 citations62
US12326407B2Jun 10, 2025
Inspection apparatus and inspection method
ASML NETHERLANDS BV0 citations61
US11692948B2Jul 4, 2023
Inspection apparatus and inspection method
ASML NETHERLANDS BV0 citations61
US12164233B2Dec 10, 2024
Metrology method and apparatus for of determining a complex-valued field
ASML NETHERLANDS BV0 citations59
US10234384B2Mar 19, 2019
Inspection apparatus and method, lithographic apparatus, method of manufacturing devices and computer program
ASML NETHERLANDS BV0 citations47
SMILDE HENDRIK JAN HIDDE
4 patentsUS8411287B2Apr 2, 2013
Metrology method and apparatus, lithographic apparatus, device manufacturing method and substrate
SMILDE HENDRIK JAN HIDDE85 citations97
US9140998B2Sep 22, 2015
Metrology method and inspection apparatus, lithographic system and device manufacturing method
SMILDE HENDRIK JAN HIDDE24 citations92
US8223347B2Jul 17, 2012
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
SMILDE HENDRIK JAN HIDDE4 citations62
US9081304B2Jul 14, 2015
Substrate, an inspection apparatus, and a lithographic apparatus
SMILDE HENDRIK JAN HIDDE1 citations51
KONINKL PHILIPS ELECTRONICS NV
3 patentsUS7791507B2Sep 7, 2010
Coder and a method of coding for codes with a parity-complementary word assignment having a constraint of d=1 , r=2
KONINKL PHILIPS ELECTRONICS NV4 citations63
US7660224B2Feb 9, 2010
DC-controlled encoding for optical storage system
KONINKL PHILIPS ELECTRONICS NV3 citations62
US7489258B2Feb 10, 2009
Device and method for embedding a secondary signal in a primary data bit stream on an optical disc
KONINKL PHILIPS ELECTRONICS NV3 citations56