Inventor

WARNAAR PATRICK

NL52 patents

⚠️ This page may combine multiple inventors who share the name “WARNAAR PATRICK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WARNAAR PATRICK

ASML NETHERLANDS BV

Metrology method and inspection apparatus, lithographic system and device manufacturing method

Computational metrology

Metrology apparatus and method for determining a characteristic of one or more structures on a substrate

Metrology system and method for determining a characteristic of one or more structures on a substrate

Method and apparatus for design of a metrology target

Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method

Metrology method and apparatus, substrate, lithographic system and device manufacturing method

Inspection apparatus and methods, methods of manufacturing devices

Metrology apparatus and method for determining a characteristic of one or more structures on a substrate

Metrology system and method for determining a characteristic of one or more structures on a substrate

Metrology method, patterning device, apparatus and computer program

Metrology apparatus and method for determining a characteristic of one or more structures on a substrate

Metrology method, patterning device, apparatus and computer program

Method of determining control parameters of a device manufacturing process

Method of determining control parameters of a device manufacturing process

Metrology method and apparatus, substrate, lithographic system and device manufacturing method

Metrology method and apparatus, computer program and lithographic system

Method of determining a value of a parameter of interest of a patterning process, device manufacturing method

Metrology method and associated computer product

Mark structure for coarse wafer alignment and method for manufacturing such a mark structure

Computational metrology

Metrology system and method for determining a characteristic of one or more structures on a substrate

Target for measuring a parameter of a lithographic process

Metrology system and method for determining a characteristic of one or more structures on a substrate

Metrology apparatus and method for determining a characteristic of one or more structures on a substrate

Metrology apparatus and method for determining a characteristic of one or more structures on a substrate

Method and apparatus for illumination adjustment

Method and apparatus for design of a metrology target

Method of determining control parameters of a device manufacturing process

Metrology method and apparatus, substrate, lithographic system and device manufacturing method

Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method

Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method

Method and system for predicting process information with a parameterized model

Metrology method and apparatus, computer program and lithographic system

Metrology method and apparatus, and device manufacturing method

Substrate and patterning device for use in metrology, metrology method and device manufacturing method

Target for measuring a parameter of a lithographic process

Metrology apparatus and method for determining a characteristic of one or more structures on a substrate

Metrology targets

SMILDE HENDRIK JAN HIDDE

Metrology method and apparatus, and device manufacturing method

Metrology method and inspection apparatus, lithographic system and device manufacturing method

BIJNEN FRANCISCUS GODEFRIDUS CASPER

Alignment mark and a method of aligning a substrate comprising such an alignment mark

Lithographic apparatus and device manufacturing method to determine improved absolute position of exposure fields using mark structures

WARNAAR PATRICK

Metrology method and apparatus, and device manufacturing method

Mark structure for coarse wafer alignment and method for manufacturing such a mark structure

HULSEBOS EDO MARIA

Alignment system and alignment marks for use therewith

Alignment system and alignment marks for use therewith

VAN DER SCHAAR MAURITS

Substrate and patterning device for use in metrology, metrology method and device manufacturing method

ASML HOLDING NV

Method for filtering an image and associated metrology apparatus

VAN HAREN RICHARD JOHANNES FRANCISCUS

Marker structure and method of forming the same