Inventor
HUDSON CARISSIMA MARIE
US31 patents
⚠️ This page may combine multiple inventors who share the name “HUDSON CARISSIMA MARIE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
GLOBALWAFERS CO LTD
23 patentsUS11111597B2Sep 7, 2021
Methods for growing a nitrogen doped single crystal silicon ingot using continuous Czochralski method
GLOBALWAFERS CO LTD9 citations85
US11142844B2Oct 12, 2021
High resistivity single crystal silicon ingot and wafer having improved mechanical strength
GLOBALWAFERS CO LTD5 citations82
US11111596B2Sep 7, 2021
Single crystal silicon ingot having axial uniformity
GLOBALWAFERS CO LTD3 citations72
US11739437B2Aug 29, 2023
Resistivity stabilization measurement of fat neck slabs for high resistivity and ultra-high resistivity single crystal silicon ingot growth
GLOBALWAFERS CO LTD2 citations71
US11408090B2Aug 9, 2022
Methods for growing a single crystal silicon ingot using continuous Czochralski method
GLOBALWAFERS CO LTD3 citations71
US12410538B2Sep 9, 2025
Use of arrays of quartz particles during single crystal silicon ingot production
GLOBALWAFERS CO LTD0 citations62
US11680335B2Jun 20, 2023
Single crystal silicon ingot having axial uniformity
GLOBALWAFERS CO LTD0 citations62
US11680336B2Jun 20, 2023
Methods for growing a nitrogen doped single crystal silicon ingot using continuous Czochralski method
GLOBALWAFERS CO LTD0 citations62
US11655559B2May 23, 2023
High resistivity single crystal silicon ingot and wafer having improved mechanical strength
GLOBALWAFERS CO LTD0 citations61
US11655560B2May 23, 2023
High resistivity single crystal silicon ingot and wafer having improved mechanical strength
GLOBALWAFERS CO LTD0 citations61
US10513796B2Dec 24, 2019
Methods for producing low oxygen silicon ingots
GLOBALWAFERS CO LTD1 citations61
US11932962B2Mar 19, 2024
Systems and methods for production of silicon using a horizontal magnetic field
GLOBALWAFERS CO LTD0 citations59
US11873574B2Jan 16, 2024
Systems and methods for production of silicon using a horizontal magnetic field
GLOBALWAFERS CO LTD0 citations59
US12031229B2Jul 9, 2024
Ingot puller apparatus having heat shields with feet having an apex
GLOBALWAFERS CO LTD0 citations58
US11873575B2Jan 16, 2024
Ingot puller apparatus having heat shields with voids therein
GLOBALWAFERS CO LTD0 citations58
US11767611B2Sep 26, 2023
Methods for producing a monocrystalline ingot by horizontal magnetic field Czochralski
GLOBALWAFERS CO LTD0 citations58
US12351938B2Jul 8, 2025
Methods for producing a product ingot having low oxygen content
GLOBALWAFERS CO LTD0 citations51
US12486593B2Dec 2, 2025
Axial positioning of magnetic poles while producing a silicon ingot
GLOBALWAFERS CO LTD0 citations48
US12486594B2Dec 2, 2025
Ingot puller apparatus that axially position magnetic poles
GLOBALWAFERS CO LTD0 citations48
US12221718B2Feb 11, 2025
Systems and methods for controlling a gas dopant vaporization rate during a crystal growth process
GLOBALWAFERS CO LTD0 citations47
US12195871B2Jan 14, 2025
Systems and methods for controlling a gas dopant vaporization rate during a crystal growth process
GLOBALWAFERS CO LTD0 citations47
US12546028B2Feb 10, 2026
Ingot puller apparatus having dopant feeders for adding a plurality of dopant batches
GLOBALWAFERS CO LTD0 citations45
US12590383B2Mar 31, 2026
Synthetic crucibles with rim coating
GLOBALWAFERS CO LTD0 citations44
GLOBAL WAFERS CO LTD
4 patentsUS10954606B2Mar 23, 2021
Methods for modeling the impurity concentration of a single crystal silicon ingot
GLOBAL WAFERS CO LTD2 citations71
US10793969B2Oct 6, 2020
Sample rod growth and resistivity measurement during single crystal silicon ingot production
GLOBAL WAFERS CO LTD2 citations69
US10781532B2Sep 22, 2020
Methods for determining the resistivity of a polycrystalline silicon melt
GLOBAL WAFERS CO LTD1 citations59
US11047066B2Jun 29, 2021
Growth of plural sample rods to determine impurity build-up during production of single crystal silicon ingots
GLOBAL WAFERS CO LTD0 citations50
SUNEDISON SEMICONDUCTOR LTD UEN201334164H
2 patentsUS10453703B2Oct 22, 2019
Method of treating silicon wafers to have intrinsic gettering and gate oxide integrity yield
SUNEDISON SEMICONDUCTOR LTD UEN201334164H1 citations59
US10707093B2Jul 7, 2020
Method of treating silicon wafers to have intrinsic gettering and gate oxide integrity yield
SUNEDISON SEMICONDUCTOR LTD UEN201334164H0 citations49