Inventor
KUROSAWA YOICHI
JP10 patents
⚠️ This page may combine multiple inventors who share the name “KUROSAWA YOICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEMICONDUCTOR ENERGY LAB
8 patentsUS10522347B2Dec 31, 2019
Method for manufacturing sputtering target, method for forming oxide film, and transistor
SEMICONDUCTOR ENERGY LAB4 citations84
US9806201B2Oct 31, 2017
Semiconductor device
SEMICONDUCTOR ENERGY LAB16 citations84
US9437428B2Sep 6, 2016
Method of manufacturing a semiconductor device having an oxide semiconductor layer with increased hydrogen concentration
SEMICONDUCTOR ENERGY LAB7 citations84
US9267199B2Feb 23, 2016
Method for manufacturing sputtering target, method for forming oxide film, and transistor
SEMICONDUCTOR ENERGY LAB6 citations84
US11637015B2Apr 25, 2023
Method for manufacturing sputtering target, method for forming oxide film, and transistor
SEMICONDUCTOR ENERGY LAB1 citations73
US11139166B2Oct 5, 2021
Method for manufacturing sputtering target, method for forming oxide film, and transistor
SEMICONDUCTOR ENERGY LAB1 citations73
US12349460B2Jul 1, 2025
Manufacturing method of semiconductor device
SEMICONDUCTOR ENERGY LAB0 citations62
US11967505B2Apr 23, 2024
Method for manufacturing sputtering target, method for forming oxide film, and transistor
SEMICONDUCTOR ENERGY LAB0 citations62