Inventor
CHUANG YING-LIANG
TW43 patents
Patents
43 patentsUS10811320B2Oct 20, 2020
Footing removal in cut-metal process
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US10490410B2Nov 26, 2019
Self-protective layer formed on high-K dielectric layer
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US10283503B2May 7, 2019
Metal gate structure and methods thereof
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations84
US10283417B1May 7, 2019
Self-protective layer formed on high-k dielectric layers with different materials
TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US10170317B1Jan 1, 2019
Self-protective layer formed on high-k dielectric layer
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US9449841B2Sep 20, 2016
Methods and systems for chemical mechanical polish and clean
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations83
US11189714B2Nov 30, 2021
Gate stack structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11114436B2Sep 7, 2021
Metal gate structure and methods thereof
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10748898B2Aug 18, 2020
Metal gate structure and methods thereof
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10361133B2Jul 23, 2019
High-K metal gate and method for fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations71
US12376326B2Jul 29, 2025
Gate resistance improvement and method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12376372B2Jul 29, 2025
Fin field-effect transistor and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12255107B2Mar 18, 2025
Semiconductor device and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12051626B2Jul 30, 2024
Fin Field-Effect transistor and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12015077B2Jun 18, 2024
Metal gate using monolayers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11996340B2May 28, 2024
Passivation layer for protecting semiconductor structures
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11923428B2Mar 5, 2024
Fin field-effect transistor and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11923201B2Mar 5, 2024
Self-protective layer formed on high-K dielectric layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11887896B2Jan 30, 2024
Semiconductor device and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11854903B2Dec 26, 2023
Footing removal in cut-metal process
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11810978B2Nov 7, 2023
Gate resistance improvement and method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11658225B2May 23, 2023
Fin field-effect transistor and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11404552B2Aug 2, 2022
Fin Field-Effect Transistor and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11362006B2Jun 14, 2022
Semiconductor device and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11257924B2Feb 22, 2022
Metal gate using monolayers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11114347B2Sep 7, 2021
Self-protective layer formed on high-k dielectric layers with different materials
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11031500B2Jun 8, 2021
Gate resistance improvement and method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10937656B2Mar 2, 2021
Self-protective layer formed on high-k dielectric layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12520531B2Jan 6, 2026
Semiconductor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11854870B2Dec 26, 2023
Etch method for interconnect structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11031302B2Jun 8, 2021
High-k metal gate and method for fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12363966B2Jul 15, 2025
Semiconductor devices and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations58
US12183637B2Dec 31, 2024
Fin field-effect transistor and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations58
US11715670B2Aug 1, 2023
FIN field-effect transistor and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations58
US11682669B2Jun 20, 2023
Metal gate structure and methods thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10720516B2Jul 21, 2020
Gate stack structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10541317B2Jan 21, 2020
Method of forming a metal gate using monolayers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US11444173B2Sep 13, 2022
Semiconductor device structure with salicide layer and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10755934B2Aug 25, 2020
Systems and methods for chemical mechanical polish and clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10515808B2Dec 24, 2019
Systems and methods for chemical mechanical polish and clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US12074035B2Aug 27, 2024
Method for partially removing tungsten in semiconductor manufacturing process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US12389661B2Aug 12, 2025
Method for modifying metal-including material in semiconductor manufacturing process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48
US12490497B2Dec 2, 2025
Metal gate patterning
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations44